SCHEMBL5857331

SCHEMBL5857331

CCOc1ccc(S(C)(C)OS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.51
CA1 P00915 1/20 0.51
CA2 P00918 1/20 0.51
CA7 P43166 1/20 0.51
CA9 Q16790 1/20 0.51
ALDH1A1 P00352 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
MAPK1 P28482 2/20 0.46
LMNA P02545 2/20 0.46
KMT2A Q03164 2/20 0.46
MEN1 O00255 1/20 0.46
MAPT P10636 1/20 0.46
NQO1 P15559 1/20 0.44
GAA P10253 3/20 0.43
NPSR1 Q6W5P4 1/20 0.43
PTPRZ1 P23471 1/20 0.43
TDP1 Q9NUW8 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
SQSTM1 Q13501 1/20 0.41
KEAP1 Q14145 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5856347 0.88 CA12 (0.54) CA12CA1CA2CA7CA9
SCHEMBL5856411 0.84 CA12 (0.51) CA12CA1CA2CA7CA9
SCHEMBL5858672 0.84 CA1 (0.45) CA12CA1CA2CA7CA9
SCHEMBL5856273 0.83 CA1 (0.44) CA12CA1CA2CA7CA9
SCHEMBL5857846 0.82 PKM (0.50) CA1CA2ALDH1A1SMN1; SMN2MAPK1
SCHEMBL20314687 0.78 PTPRZ1 (0.67) CA12CA1CA2CA7CA9
SCHEMBL562051 0.78 GAA (0.43) CA12CA1CA2CA7CA9
SCHEMBL36458 0.78 HTR6 (0.39) CA12CA1CA2CA7CA9
SCHEMBL12274397 0.77 MAPT (0.56) ALDH1A1SMN1; SMN2LMNAKMT2AMEN1
SCHEMBL12273951 0.75 MMP2 (0.43) CA1CA2KMT2AMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7078148-B2 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits JSR CORPORATION (JP) 2006-07-18 US disclosed
US-20040072094-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2004-04-15 US disclosed