SCHEMBL5874963

SCHEMBL5874963

CC/C=C\C/C=C\C/C=C\CCCCCCCC(=O)ON1CCCCC1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.59
CYP3A4 P08684 3/20 0.59
ALOX15 P16050 3/20 0.59
HSD17B10 Q99714 3/20 0.59
TDP1 Q9NUW8 3/20 0.59
TSHR P16473 2/20 0.59
F7 P08709 6/20 0.54
F3 P13726 6/20 0.54
CYP19A1 P11511 4/20 0.54
PPARG P37231 4/20 0.54
PPARD Q03181 4/20 0.54
PPARA Q07869 4/20 0.54
OXER1 Q8TDS5 3/20 0.54
PTGS1 P23219 3/20 0.54
KDM4E B2RXH2 3/20 0.54
MAPT P10636 2/20 0.54
NR1I2 O75469 2/20 0.54
PTGS2 P35354 2/20 0.54
KMT2A Q03164 2/20 0.54
FFAR1 O14842 2/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28520277 0.93 ALDH1A1 (0.64) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL5875012 0.92 ALDH1A1 (0.54) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL5875143 0.88 MGLL (0.55) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL5874325 0.87 TERT (0.50) CYP3A4ALOX15HSD17B10F7F3
SCHEMBL5874554 0.87 ALDH1A1 (0.57) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL28907757 0.85 ALDH1A1 (0.58) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
Methyl Linolenate SCHEMBL20558621 0.81 ALDH1A1 (0.68) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL15737064 0.81 ADORA3 (0.55) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL28518217 0.80 MGLL (0.58) ALDH1A1CYP3A4ALOX15HSD17B10TDP1
SCHEMBL28526154 0.80 TERT (0.54) CYP3A4ALOX15HSD17B10TDP1F7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed