SCHEMBL5875413

SCHEMBL5875413

O=C(ON1CCCCC1)C(Cl)(Cl)Cl

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
ALDH1A1 P00352 2/20 0.32
CA2 P00918 1/20 0.31
CHKA P35790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10787630 0.88 ALDH1A1 (0.32) ALDH1A1
SCHEMBL5875307 0.80 CA2 (0.35) CA2CHKA
SCHEMBL3312069 0.78 SMN1; SMN2 (0.40) MEN1KMT2AALDH1A1
SCHEMBL980149 0.77 MLYCD (0.32) MEN1KMT2AALDH1A1
SCHEMBL8433485 0.77 HPGD (0.36) MEN1KMT2AALDH1A1
SCHEMBL27758892 0.77 HPGD (0.36) MEN1KMT2AALDH1A1
Hydrochloric Acid SCHEMBL27834363 0.76 HPGD (0.35) MEN1KMT2AALDH1A1
Hydrochloric Acid SCHEMBL27855473 0.76 HPGD (0.35) MEN1KMT2AALDH1A1
SCHEMBL8431323 0.74 HPGD (0.33) MEN1KMT2AALDH1A1
SCHEMBL2721518 0.74 MLYCD (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-62253140-A None JP disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP disclosed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US disclosed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP disclosed
CN-1223650-A Piperidines and pyrrolidines MERCK PATENT GMBH (DE) 1999-07-21 CN disclosed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO disclosed
EP-0426087-B1 Dye fixing material FUJI PHOTO FILM CO LTD (JP) 1997-01-22 EP disclosed
EP-0383358-B1 Light-sensitive material containing silver halide reducing agent and polymerizable compound FUJI PHOTO FILM CO LTD (JP) 1995-04-26 EP disclosed
US-4610957-A SILVER HALIDE EMULSIONS, ACID AND BASE PRECUSORS FUJI PHOTO FILM CO., LTD. (JP) 1986-09-09 US disclosed
US-4603103-A THERMALLY DECOMPOSABLE ORGANIC SILVER SALT ON A SUPPORT FUJI PHOTO FILM CO., LTD. (JP) 1986-07-29 US disclosed
US-4595652-A Contains dye-providing material FUJI PHOTO FILM CO., LTD. (JP) 1986-06-17 US disclosed
US-4590152-A STORAGE STABILITY, HIGH IMAGE DESITY FUJI PHOTO FILM CO., LTD. (JP) 1986-05-20 US disclosed
US-4584256-A AGING RESISTANCE RHONE-POULENC SYSTEMES (FR) 1986-04-22 US disclosed
EP-0143424-A2 Heat-developable light-sensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1985-06-05 EP disclosed
EP-0122512-A2 Dry image-forming process and material therefor FUJI PHOTO FILM CO., LTD. (JP) 1984-10-24 EP disclosed
EP-0119615-A2 Dry image-forming process FUJI PHOTO FILM CO., LTD. (JP) 1984-09-26 EP disclosed
US-4088496-A SILVER SALT, DEVELOPER, BINDER AND AN ACTIVATOR, THE ACID PORTION OF WHICH IS 2-CARBOXYCARBOXAMIDE EASTMAN KODAK COMPANY (US) 1978-05-09 US disclosed
US-4060420-A PHOTOGRAPHY EASTMAN KODAK COMPANY (US) 1977-11-29 US disclosed