Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR4 | Q5NUL3 | 5/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | METAP2 | P50579 | 1/20 | 0.39 |
| ▸ | RAPGEF4 | Q8WZA2 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2512387 | 0.95 | RAPGEF4 (0.45) | FFAR4LMNATDP1RAPGEF4ALDH1A1 | |
| SCHEMBL6282642 | 0.91 | FFAR4 (0.47) | FFAR4LMNATDP1ALDH1A1MAPT | |
| SCHEMBL3190654 | 0.91 | FFAR4 (0.47) | FFAR4LMNATDP1SMN1; SMN2GAA | |
| SCHEMBL5066003 | 0.90 | FFAR4 (0.41) | FFAR4LMNATDP1METAP2RAPGEF4 | |
| SCHEMBL547725 | 0.87 | CYP1A2 (0.40) | FFAR4RAPGEF4ALDH1A1MAPTHSD11B1 | |
| SCHEMBL2512390 | 0.86 | FFAR4 (0.36) | FFAR4LMNATDP1RAPGEF4ALDH1A1 | |
| SCHEMBL5415913 | 0.85 | CYP1A2 (0.44) | FFAR4LMNARAPGEF4ALDH1A1POLB | |
| SCHEMBL2284440 | 0.85 | CYTH2 (0.47) | LMNATDP1ALDH1A1POLBMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL546940 | 0.84 | GPR3 (0.43) | FFAR4LMNAMETAP2RAPGEF4MAPT | |
| SCHEMBL424812 | 0.84 | CYP1A2 (0.40) | FFAR4LMNARAPGEF4MAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| CN-122085599-A | Composition, patterning method, formed pattern, semiconductor device and application thereof | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122085598-A | Composition, patterning method, formed pattern, semiconductor device and application thereof | — | 2026-05-26 | — | — | CN | disclosed |
| US-20250216790-A1 | MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE | GEMINATIO, INC., | 2025-07-03 | — | — | US | disclosed |
| US-20250216783-A1 | ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2003021357-A1 | FREE-ACID CONTAINING POLYMERS AND THEIR USE IN PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-03-13 | — | — | WO | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| WO-2002082184-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |