Methacrylic Acid

Methacrylic Acid

SCHEMBL5902071

C=C(C)C(=O)O.C=C(C=Cc1ccccc1)C(=O)OC

nearest known ligand 0.53

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.53
GLA P06280 1/20 0.51
TDP1 Q9NUW8 1/20 0.51
HAO1 Q9UJM8 1/20 0.50
HDAC3 O15379 2/20 0.46
HDAC4 P56524 2/20 0.46
HDAC1 Q13547 2/20 0.46
HDAC2 Q92769 2/20 0.46
HDAC8 Q9BY41 2/20 0.46
HDAC6 Q9UBN7 2/20 0.46
MAPT P10636 3/20 0.46
LMNA P02545 3/20 0.46
PLIN1 O60240 2/20 0.46
RECQL P46063 2/20 0.46
PLIN5 Q00G26 2/20 0.46
ABHD5 Q8WTS1 2/20 0.46
TNKS O95271 1/20 0.46
HCAR2 Q8TDS4 1/20 0.46
HDAC7 Q8WUI4 1/20 0.46
HDAC10 Q969S8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3141759 0.94 GLA (0.51) ALDH1A1GLATDP1HAO1HDAC3
SCHEMBL225081 0.94 ALDH1A1 (0.54) ALDH1A1GLATDP1HAO1HDAC3
Methacrylic Acid SCHEMBL600293 0.87 RAB9A (0.49) ALDH1A1GLATDP1HAO1MAPT
Methacrylic Acid SCHEMBL6908387 0.85 TDP1 (0.60) ALDH1A1GLATDP1HAO1HDAC3
Acrylonitrile SCHEMBL2138933 0.84 ALDH1A1 (0.46) ALDH1A1GLATDP1HAO1HDAC3
Methacrylic Acid SCHEMBL390857 0.84 MEN1 (0.53) ALDH1A1GLATDP1HAO1HDAC3
SCHEMBL1087500 0.83 RAB9A (0.51) ALDH1A1GLATDP1MAPTLMNA
SCHEMBL28228677 0.82 GLA (0.46) ALDH1A1GLATDP1HAO1HDAC3
SCHEMBL9482564 0.82 GLA (0.43) ALDH1A1GLATDP1HDAC3HDAC4
(Z)-1,2-Diphenylethene SCHEMBL5875864 0.82 ALDH1A1 (0.56) ALDH1A1GLATDP1HDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7078151-B2 Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO., LTD. (JP) 2006-07-18 US disclosed