Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.36 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.33 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.33 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | VDR | P11473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5950522 | 0.84 | ESR1 (0.40) | ESR1ESR2ARGABRA1GABRB2 | |
| SCHEMBL26357011 | 0.83 | ACHE (0.30) | ESR1ESR2 | |
| SCHEMBL23220761 | 0.82 | HMGCR (0.33) | — | |
| SCHEMBL5950461 | 0.81 | ESR1 (0.46) | ESR1ESR2ARHRH3CHRM3 | |
| SCHEMBL26357072 | 0.80 | KDM4E (0.34) | — | |
| SCHEMBL26357080 | 0.78 | — | — | |
| SCHEMBL5666707 | 0.78 | ALDH1A1 (0.48) | ESR1 | |
| SCHEMBL2943735 | 0.77 | ALDH1A1 (0.44) | ESR1ESR2AR | |
| SCHEMBL24118568 | 0.77 | KLF10 (0.41) | ESR1ESR2ARGABRA1GABRB2 | |
| SCHEMBL7812830 | 0.75 | CA12 (0.46) | ESR1ESR2ARGABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7005216-B2 | Photo mask | RENESAS TECHNOLOGY CORP. (JP) | 2006-02-28 | — | — | US | disclosed |
| US-6790564-B2 | FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY | RENESAS TECHNOLOGY CORPORATION (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20030129505-A1 | Krypton fluoride laser lithography; photoresist pattern | RENESAS ELECTRONICS CORPORATION (JP) | 2003-07-10 | — | — | US | disclosed |
| US-20020086222-A1 | Photomask and manufacturing method of an electronic device therewith | RENESAS ELECTRONICS CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |