SCHEMBL5950554

SCHEMBL5950554

CC(O)Cc1cc(Cl)cc(CC(C)O)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
RECQL P46063 1/20 0.42
PNMT P11086 2/20 0.41
GABRA1 P14867 2/20 0.38
GABRB1 P18505 1/20 0.38
SLC6A2 P23975 1/20 0.35
SLC6A3 Q01959 1/20 0.35
NOS2 P35228 1/20 0.34
IDO1 P14902 2/20 0.33
ALOX15 P16050 1/20 0.33
ALOX12 P18054 1/20 0.33
ALDH1A1 P00352 1/20 0.33
NR3C1 P04150 1/20 0.32
PGR P06401 1/20 0.32
NR3C2 P08235 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
GABRB2 P47870 1/20 0.31
ATM Q13315 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29889000 0.95 TSHR (0.42) TSHRRECQLPNMTGABRA1GABRB1
SCHEMBL11571104 0.89 TSHR (0.39) TSHRRECQLPNMTGABRA1GABRB1
SCHEMBL962294 0.87 NOS2 (0.40) TSHRRECQLGABRA1SLC6A2SLC6A3
SCHEMBL8985983 0.80 TAAR1 (0.43) RECQLGABRA1SLC6A2SLC6A3ALOX15
SCHEMBL2427261 0.79 PNMT (0.69) TSHRRECQLPNMTIDO1
SCHEMBL21580259 0.78 ACHE (0.40) TSHRRECQLSLC6A2SLC6A3ALOX15
SCHEMBL2424315 0.76 SLC6A2 (0.61) SLC6A2SLC6A3IDO1ALDH1A1CYP1A2
SCHEMBL4158699 0.76 SLC6A2 (0.61) SLC6A2SLC6A3IDO1ALDH1A1CYP1A2
SCHEMBL4161150 0.76 SLC6A2 (0.61) SLC6A2SLC6A3IDO1ALDH1A1CYP1A2
SCHEMBL5950180 0.76 GABRA1 (0.38) RECQLGABRA1GABRB1SLC6A2SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7005216-B2 Photo mask RENESAS TECHNOLOGY CORP. (JP) 2006-02-28 US disclosed
US-6790564-B2 FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY RENESAS TECHNOLOGY CORPORATION (JP) 2004-09-14 US disclosed
US-20030129505-A1 Krypton fluoride laser lithography; photoresist pattern RENESAS ELECTRONICS CORPORATION (JP) 2003-07-10 US disclosed
US-20020086222-A1 Photomask and manufacturing method of an electronic device therewith RENESAS ELECTRONICS CORPORATION (JP) 2002-07-04 US disclosed