SCHEMBL5984487

SCHEMBL5984487

Oc1ccc2nc(O)c(O)nc2c1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.39
PDE3B Q13370 1/20 0.38
PDE3A Q14432 1/20 0.38
ALDH1A1 P00352 2/20 0.35
MAPT P10636 2/20 0.35
GAA P10253 1/20 0.35
RAB9A P51151 1/20 0.35
KMT2A Q03164 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
AMY1A P0DUB6 2/20 0.34
PTPN22 Q9Y2R2 1/20 0.33
NQO2 P16083 2/20 0.32
PIM1 P11309 1/20 0.32
ADAMTS4 O75173 1/20 0.32
EGFR P00533 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
LMNA P02545 1/20 0.32
FYN P06241 1/20 0.32
MMP2 P08253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31070283 0.77 MAPT (0.63) ACHEALDH1A1MAPTGAARAB9A
SCHEMBL6881938 0.77 MAPT (0.63) ACHEALDH1A1MAPTGAARAB9A
SCHEMBL29966114 0.77 MAPT (0.63) ACHEALDH1A1MAPTGAARAB9A
SCHEMBL17866966 0.76 ACHE (0.75) ACHEALDH1A1MAPTGAARAB9A
SCHEMBL9840943 0.73 ALDH1A1 (0.50) ACHEPDE3BPDE3AALDH1A1MAPT
SCHEMBL28587806 0.70 L3MBTL1 (0.50) ALDH1A1MAPTGAARAB9AKMT2A
SCHEMBL9533409 0.70 MAPT (0.50) ACHEALDH1A1MAPTGAAKMT2A
SCHEMBL9534423 0.68 MAPT (0.39) ACHEMAPTGAARAB9AKMT2A
SCHEMBL9532647 0.68 ADRA2A (0.37) ACHEALDH1A1MAPTGAARAB9A
SCHEMBL9534598 0.67 MAPT (0.41) ALDH1A1MAPTGAARAB9AKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060234170-A1 Thermally developable photosensitive material FUJIFILM CORPORATION (JP) 2006-10-19 US disclosed
US-20040009441-A1 Thermally developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2004-01-15 US disclosed
EP-1355190-A1 Thermally developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2003-10-22 EP disclosed
US-4312807-A HEAT RESISTANT PIGMENTS FOR POLYVINYL CHLORIDE AND POLYETHYLENE HOECHST AKTIENGESELLSCHAFT (DE) 1982-01-26 US disclosed