SCHEMBL599353

SCHEMBL599353

Cc1ccc(C(=O)Nc2ccc(F)c([Ti](C3=CC=CC3)(C3=CC=CC3)c3c(F)ccc(NC(=O)c4ccc(C)cc4)c3F)c2F)cc1

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.45
NPC1 O15118 8/20 0.43
ALDH1A1 P00352 4/20 0.38
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
KCNMA1 Q12791 1/20 0.38
RAB9A P51151 8/20 0.38
HPGD P15428 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
GAA P10253 2/20 0.37
MAOB P27338 1/20 0.37
LMNA P02545 1/20 0.37
AHR P35869 1/20 0.37
HDAC1 Q13547 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL267396 0.91 KMT2A (0.43) POLBNPC1MEN1KMT2AMAPT
SCHEMBL482491 0.90 RAB9A (0.44) POLBNPC1ALDH1A1MEN1KMT2A
SCHEMBL482948 0.88 GAA (0.41) POLBNPC1ALDH1A1MAPTHTT
SCHEMBL483372 0.88 RAB9A (0.42) POLBNPC1ALDH1A1MEN1KMT2A
SCHEMBL483207 0.84 HTT (0.34) POLBNPC1MEN1KMT2AMAPT
SCHEMBL28741261 0.84 POLB (0.38) POLBNPC1ALDH1A1MEN1KMT2A
SCHEMBL483069 0.83 HDAC1 (0.39) POLBNPC1ALDH1A1MAPTRAB9A
SCHEMBL269422 0.80 PDK1 (0.34) NPC1MEN1KMT2A
SCHEMBL483118 0.80 KDM4E (0.35) POLBNPC1ALDH1A1RAB9A
SCHEMBL483079 0.80 HTT (0.47) NPC1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
US-8114569-B2 Maskless photopolymer exposure process and apparatus PHOTOCENTRIC LIMITED (GB) 2012-02-14 US disclosed
US-20090190107-A1 MASKLESS PHOTOPOLYMER EXPOSURE PROCESS AND APPARATUS PHOTOCENTRIC LIMITED (GB) 2009-07-30 US disclosed