Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 3/20 | 0.34 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 3/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | RXFP1 | Q9HBX9 | 2/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 4/20 | 0.32 |
| ▸ | RAB9A | P51151 | 4/20 | 0.32 |
| ▸ | TAS1R3 | Q7RTX0 | 3/20 | 0.32 |
| ▸ | TAS1R1 | Q7RTX1 | 3/20 | 0.32 |
| ▸ | TAS1R2 | Q8TE23 | 3/20 | 0.32 |
| ▸ | POLB | P06746 | 3/20 | 0.32 |
| ▸ | PTGFR | P43088 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL599353 | 0.84 | POLB (0.45) | HTTSMN1; SMN2LMNANPC1RAB9A | |
| SCHEMBL483372 | 0.84 | RAB9A (0.42) | HTTSMN1; SMN2LMNARXFP1NPC1 | |
| SCHEMBL483069 | 0.81 | HDAC1 (0.39) | SMN1; SMN2LMNAPKMCA1CA2 | |
| SCHEMBL482491 | 0.81 | RAB9A (0.44) | HTTSMN1; SMN2NPC1RAB9APOLB | |
| SCHEMBL267396 | 0.80 | KMT2A (0.43) | SMN1; SMN2LMNARXFP1NPC1RAB9A | |
| SCHEMBL6662487 | 0.80 | CA1 (0.30) | CA1CA2CA9NPC1 | |
| SCHEMBL268803 | 0.80 | HPGD (0.44) | SMN1; SMN2LMNANPC1RAB9APOLB | |
| SCHEMBL269422 | 0.78 | PDK1 (0.34) | NPC1MEN1KMT2A | |
| SCHEMBL483118 | 0.78 | KDM4E (0.35) | NPC1RAB9APOLB | |
| SCHEMBL483079 | 0.78 | HTT (0.47) | HTTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113168093-B | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-113383273-B | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-114402256-A | Organic film, method for producing same, composition, laminate, and semiconductor device | 富士胶片株式会社 | 2022-04-26 | — | — | CN | disclosed |
| EP-3893054-A1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM Corporation (JP) | 2021-10-13 | — | — | EP | disclosed |
| EP-3893053-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE | FUJIFILM Corporation (JP) | 2021-10-13 | — | — | EP | disclosed |
| US-20210302835-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20210302836-A1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-30 | — | — | US | disclosed |
| CN-113383273-A | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2021-09-10 | — | — | CN | disclosed |
| CN-113168093-A | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-20210197447-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2021-07-01 | — | — | US | disclosed |
| US-20030091933-A1 | Photosensitive composition and negative working lithographic printing plate | FUJIFILM CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030084806-A1 | FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES | FUJIFILM CORPORATION (JP) | 2003-05-08 | — | — | US | disclosed |
| EP-1288720-A1 | Plate-making method of printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-1249731-A2 | Photosensitive composition and negative working lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-16 | — | — | EP | disclosed |
| EP-1238801-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-0860741-B1 | Photopolymerizable composition | FUJI PHOTO FILM CO LTD (JP) | 2001-05-16 | — | — | EP | disclosed |
| US-6051367-A | COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0949540-A1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJI PHOTO FILM CO., LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0860741-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |
| US-5026625-A | Photoinitiators for polymerization of ethylenically unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1991-06-25 | — | — | US | disclosed |