Water

Water

SCHEMBL600667

O.O=CC(F)(F)F

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL10700159 1.00
SCHEMBL24190 0.95
Hydrogen Sulfide SCHEMBL8858350 0.90
SCHEMBL1023089 0.90
Hydrochloric Acid SCHEMBL7628917 0.90
Ammonia Solution, Strong SCHEMBL23510328 0.90
SCHEMBL757603 0.90
SCHEMBL15732932 0.90
SCHEMBL6462465 0.90
SCHEMBL5613088 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 401 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260117370-A1 ORGANOTIN PRECURSOR COMPOUNDS ENTEGRIS INC (US) 2026-04-30 US claimed
US-20250201553-A1 METHODS FOR MAKING EUV PATTERNABLE HARD MASKS LAM RES CORP (US) 2025-06-19 US claimed
CN-120041772-A High-wear-resistance stainless steel-based composite coating, preparation method and application thereof to cabinet door plate 湖南欧朋不锈钢制品有限责任公司 2025-05-27 CN claimed
CN-119874465-A New method for synthesizing fluoroalkyl substituted 4,4' -diaminodiphenyl methane compound 海南大学 2025-04-25 CN claimed
EP-4437160-A1 ORGANOTIN PRECURSOR COMPOUNDS Entegris, Inc. (US) 2024-10-02 EP claimed
EP-4396631-A1 TIN(II) AMIDE/ALKOXIDE PRECURSORS FOR EUV-PATTERNABLE FILMS Entegris, Inc. (US) 2024-07-10 EP claimed
CN-118284718-A Organotin precursor compounds 恩特格里斯公司 2024-07-02 CN claimed
CN-113694944-B Palladium selective hydrogenation catalyst for pyrolysis gasoline and preparation method and application thereof 中国石油化工股份有限公司 2024-06-07 CN claimed
CN-117925074-B High-wear-resistance UV matte coating and preparation process thereof 南京盛凯新材料有限公司 2024-05-17 CN claimed
CN-113663699-B Alumina carrier and preparation method thereof 中国石油化工股份有限公司 2024-05-07 CN claimed
CN-112020676-A Method of fabricating an EUV patternable hardmask 朗姆研究公司 2020-12-01 CN claimed
US-7476768-B2 Catalyst for oxidizing 2,2,2-trifluoroethanol and process for producing trifluoroacetaldehyde TOSOH F-TECH, INC. (JP) 2009-01-13 US claimed
US-20080132727-A1 Catalyst For Oxidizing 2,2,2-Trifluoroethanol And Process For Producing Trifluoroacetaldehyde TOSOH F-TECH, INC. (JP) 2008-06-05 US claimed
EP-1832343-A1 CATALYST FOR OXIDIZING 2,2,2-TRIFLUOROETHANOL AND METHOD FOR PRODUCING TRIFLUOROACETALDEHYDE Tosoh F-Tech, Inc. (JP) 2007-09-12 EP claimed
US-6833468-B2 Reacting an optically active imine with a compound that is a hemiacetal of a perfluoroalkylaldehyde or a hydrate of a perfluoroalkylaldehyde to obtain a condensate, hydrolyzing CENTRAL GLASS COMPANY, LIMITED (JP) 2004-12-21 US claimed
EP-0516311-B1 Chemical process for the manufacture of trifluoroacetaldehyde ZENECA LTD (GB) 1997-09-10 EP claimed
US-5248832-A CHEMICAL PROCESS FOR MANUFACTURING TRIFLUOROACETALDEHYDE HYDRATE OR TRIFLUOROACETALDE HEMIACETAL IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-09-28 US claimed
EP-0516311-A1 Chemical process for the manufacture of trifluoroacetaldehyde ZENECA LIMITED (GB) 1992-12-02 EP claimed
US-4642386-A REACTING WITH WATER, DISTILLING ATOCHEM (FR) 1987-02-10 US claimed
US-4393183-A STORAGE STABILITY, BONDING STRENGTH TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1983-07-12 US claimed