Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 5/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 3/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | FDPS | P14324 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25531477 | 0.94 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL22212724 | 0.89 | ALDH1A1 (0.42) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL12424294 | 0.89 | ALDH1A1 (0.54) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL18978505 | 0.83 | LMNA (0.54) | ALDH1A1TDP1TSHRLMNADNM1 | |
| SCHEMBL6057777 | 0.83 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL19982047 | 0.81 | LMNA (0.46) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL24688718 | 0.79 | LMNA (0.50) | ALDH1A1TDP1TSHRLMNADNM1 | |
| SCHEMBL26386669 | 0.79 | LMNA (0.50) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL506062 | 0.77 | ALDH1A1 (0.58) | ALDH1A1TDP1TSHRCYP3A4LMNA | |
| SCHEMBL18911540 | 0.76 | ALDH1A1 (0.32) | ALDH1A1TDP1TSHRCYP3A4DNM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118777449-B | Method for separating and detecting related substances in benzyl-2-bromoethyl ether serving as starting material of ubenimex based on gas chromatography and liquid chromatography | 山东泰合医药科技有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-116043233-A | Water-based cleaning agent and preparation method thereof | 上海承鲁科技有限公司 | 2023-05-02 | — | — | CN | claimed |
| US-20220166043-A1 | NEGATIVE ELECTRODE ELECTROLYTE SOLUTION FOR REDOX FLOW BATTERIES, AND REDOX FLOW BATTERY | ARM TECHNOLOGIES CO., LTD. (JP) | 2022-05-26 | — | — | US | claimed |
| EP-3955351-A1 | NEGATIVE ELECTRODE ELECTROLYTE SOLUTION FOR REDOX FLOW BATTERIES, AND REDOX FLOW BATTERY | Arm Technologies Co., Ltd. (JP) | 2022-02-16 | — | — | EP | claimed |
| CN-113728477-A | Negative electrode electrolyte for redox flow battery and redox flow battery | ARM技术股份有限公司 | 2021-11-30 | — | — | CN | claimed |
| EP-0418870-B1 | Radiation sensitive polymer composition | TORAY INDUSTRIES (JP) | 1996-09-04 | — | — | EP | claimed |
| EP-0418870-A2 | Radiation sensitive polymer composition | TORAY INDUSTRIES, INC. (JP) | 1991-03-27 | — | — | EP | claimed |
| EP-4400914-B1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2025-12-17 | — | — | EP | disclosed |
| US-20250368837-A1 | Composition For Forming Metal-Containing Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20250362595-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-4653955-A2 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-26 | — | — | EP | disclosed |
| US-20250347989-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-13 | — | — | US | disclosed |
| EP-4647840-A2 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITON FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-12 | — | — | EP | disclosed |
| US-5393907-A | Coating solution for forming composite metal oxide film and process for making same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-02-28 | — | — | US | disclosed |
| US-5352557-A | Ether compound as carrier liquid | FUJI XEROX CO., LTD. (JP) | 1994-10-04 | — | — | US | disclosed |
| US-5312950-A | Method for purification of alcohols | EASTMAN KODAK COMPANY (US) | 1994-05-17 | — | — | US | disclosed |
| US-5156884-A | Coating with a beta-diketone complex of a metal in an aprotic polar solvent, drying and irradiating the coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 1992-10-20 | — | — | US | disclosed |
| EP-0418870-A2 | Radiation sensitive polymer composition | TORAY INDUSTRIES, INC. (JP) | 1991-03-27 | — | — | EP | disclosed |
| US-4960618-A | COATING WITH A METAL COMPLEX IN APROTIC SOLVENT, BAKING TO FORM PROTECTIVE COATINGS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4908065-A | Treating diketone, an element or compound capable of forming complex with the diketone, salts and alkoxide hydrolysates of the elements in aprotic polar solvent | TOKYO OHKA KOGYO CO., LTD. (JP) | 1990-03-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250347989-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | EPCAM, TPR, TFRC | ALDH1A1 1851/4885TDP1 4531/4885TSHR 1169/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.