Water

Water

SCHEMBL608426

O.O.O.[Ce]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL3751176 1.00
Water SCHEMBL27529 1.00
Water SCHEMBL3890263 1.00
Water SCHEMBL3757657 1.00
Water SCHEMBL1562013 1.00
Water SCHEMBL22288080 1.00
Water SCHEMBL10490222 1.00
Water SCHEMBL3181554 1.00
Water SCHEMBL11265262 1.00
Water SCHEMBL2036070 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119920964-A Amorphous electrolyte and preparation method and application thereof 中国科学院大学 2025-05-02 CN claimed
US-12176217-B2 Method for manufacturing a semiconductor using slurry TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) 2024-12-24 US claimed
CN-114989810-B Novel trichromatic fluorescent powder based on heavy calcium carbonate and preparation method thereof 浙江工业大学 2024-02-09 CN claimed
WO-2024002119-A1 HEAT EXCHANGER AND MANUFACTURING METHOD THEREFOR 杭州三花研究院有限公司 2024-01-04 WO claimed
US-20230290641-A1 METHOD FOR MANUFACTURING A SEMICONDUCTOR USING SLURRY TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2023-09-14 US claimed
CN-114457407-A Preparation method of hexagonal phase cerium trioxide single crystal film 中国工程物理研究院材料研究所 2022-05-10 CN claimed
CN-111791629-B Security element and security document 安徽诺乐知识产权服务有限公司 2021-09-03 CN claimed
CN-111761962-B Security element 安徽原上草节能环保科技有限公司 2021-07-23 CN claimed
CN-109321803-B Heating element with porous ceramic coating 苏州艾默特材料技术有限公司 2021-03-23 CN claimed
US-20200357653-A1 SLURRY TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2020-11-12 US claimed
CN-111349963-A Hexagonal phase cerium sesquioxide single crystal film and preparation method and application thereof 中国工程物理研究院材料研究所 2020-06-30 CN claimed
US-20200135486-A1 SLURRY AND MANUFACTURING SEMICONDUCTOR USING THE SLURRY TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) 2020-04-30 US claimed
EP-2603566-B1 THERMOSETTING COATING COMPOSITION EASTMAN CHEM CO (US) 2017-02-15 EP claimed
US-8969489-B2 Thermosetting coating composition EASTMAN CHEMICAL COMPANY (US) 2015-03-03 US claimed
EP-2603566-A1 THERMOSETTING COATING COMPOSITION Eastman Chemical Company (US) 2013-06-19 EP claimed
WO-2012021491-A1 THERMOSETTING COATING COMPOSITION EASTMAN CHEMICAL COMPANY (US) 2012-02-16 WO claimed
US-20120041143-A1 THERMOSETTING COATING COMPOSITION EASTMAN CHEMICAL COMPANY (US) 2012-02-16 US claimed
US-6083838-A Method of planarizing a surface on a semiconductor wafer LUCENT TECHNOLOGIES INC. (US) 2000-07-04 US claimed
US-5525191-A Process for polishing a semiconductor substrate MOTOROLA, INC. (US) 1996-06-11 US claimed
US-4686274-A Process for preparing modified poly(alkylene carbonate) polyahls THE DOW CHEMICAL COMPANY (US) 1987-08-11 US claimed