Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | AAK1 | Q2M2I8 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CTSK | P43235 | 3/20 | 0.33 |
| ▸ | CTSS | P25774 | 2/20 | 0.33 |
| ▸ | APLNR | P35414 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | NOS1 | P29475 | 2/20 | 0.30 |
| ▸ | HTT | P42858 | 2/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | NOS3 | P29474 | 1/20 | 0.30 |
| ▸ | NOS2 | P35228 | 1/20 | 0.30 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6117658 | 0.84 | AAK1 (0.36) | TSHRAAK1CA1CA2CTSK | |
| SCHEMBL15672769 | 0.83 | CA1 (0.36) | CYP2C9CYP2C19CYP2D6TSHRCA1 | |
| SCHEMBL5008363 | 0.82 | MAPK1 (0.40) | AAK1CA1CA2CTSKAPLNR | |
| SCHEMBL6116900 | 0.81 | CA2 (0.46) | CA1CA2CTSKCTSSCA7 | |
| SCHEMBL5184423 | 0.80 | AAK1 (0.36) | AAK1APLNRKMT2AMEN1GAA | |
| SCHEMBL5184455 | 0.80 | CYP1A2 (0.38) | CYP2C9CYP2C19TSHRCTSKHTT | |
| SCHEMBL6117326 | 0.80 | CA2 (0.41) | CA1CA2CTSKKMT2ALMNA | |
| SCHEMBL20096259 | 0.79 | MEN1 (0.40) | CYP2C9CYP2C19TSHRCA1CA2 | |
| SCHEMBL6117334 | 0.78 | ALDH1A1 (0.40) | CYP2C9CYP2C19CYP2D6TSHRCA1 | |
| SCHEMBL6117496 | 0.78 | USP2 (0.41) | CA1CA2KMT2ALMNACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9720322-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9477149-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2016-10-25 | — | — | US | disclosed |
| US-20150004545-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| EP-2460802-B1 | TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALTS, PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING SAME | NAGOYA INST TECHNOLOGY (JP) | 2014-09-03 | — | — | EP | disclosed |
| US-8703969-B2 | Trifluoromethylthiophenium derivative salt, method for producing the same, and method for producing trifluoromethyl-containing compounds using the same | NAGOYA INSTITUTE OF TECHNOLOGY (JP) | 2014-04-22 | — | — | US | disclosed |
| US-20120130090-A1 | TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALT, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING THE SAME | TOSOH F-TECH, INC. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-7714079-B2 | Ultra-large scale integrated (ULSI); film stack; hydrosilation | INTERNATIONAL BUSINESS MACHINES CORPORAITON (US) | 2010-05-11 | — | — | US | disclosed |
| US-7714079-B2 | Ultra-large scale integrated (ULSI); film stack; hydrosilation | INTERNATIONAL BUSINESS MACHINES CORPORAITON (US) | 2010-05-11 | — | — | US | disclosed |
| US-20080063880-A1 | Ultra-large scale integrated (ULSI); film stack; hydrosilation | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-03-13 | — | — | US | disclosed |
| US-20080063880-A1 | Ultra-large scale integrated (ULSI); film stack; hydrosilation | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-03-13 | — | — | US | disclosed |
| US-7306853-B2 | Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-12-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | RARA, H1-0, NR2E3 | CYP2C9 2274/4885CYP2C19 2647/4885CYP2D6 3034/4885 |
| US-20120130090-A1 | TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALT, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING THE SAME | TST, CBR3, CYP4B1 | CYP2C9 23/4885CYP2C19 304/4885CYP2D6 373/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.