SCHEMBL6129303

SCHEMBL6129303

Nc1ccccc1/N=N/[N+](=O)[O-]

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 2/20 0.58
▸ RAB9A P51151 2/20 0.58
▸ GAA P10253 1/20 0.58
▸ L3MBTL1 Q9Y468 1/20 0.58
▸ PLAU P00749 1/20 0.38
▸ SMN1; SMN2 Q16637 4/20 0.37
▸ PDE7A Q13946 4/20 0.37
▸ CA9 Q16790 3/20 0.37
▸ CA12 O43570 2/20 0.36
▸ CA1 P00915 2/20 0.36
▸ CA2 P00918 2/20 0.36
▸ CA4 P22748 2/20 0.36
▸ CCNT1 O60563 1/20 0.36
▸ CCNB2 O95067 1/20 0.36
▸ CCNE2 O96020 1/20 0.36
▸ CDK1 P06493 1/20 0.36
▸ CDK4 P11802 1/20 0.36
▸ CCNB1 P14635 1/20 0.36
▸ CCNA2 P20248 1/20 0.36
▸ CCND1 P24385 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006324 0.77 NPC1 (0.59) NPC1RAB9AGAAL3MBTL1PLAU
SCHEMBL2003135 0.77 NPC1 (0.59) NPC1RAB9AGAAL3MBTL1PLAU
SCHEMBL3142212 0.76 MAPT (0.58) NPC1RAB9AGAAPLAUSMN1; SMN2
SCHEMBL3142217 0.76 MAPT (0.58) NPC1RAB9AGAAPLAUSMN1; SMN2
SCHEMBL6129305 0.76 NPC1 (0.57) NPC1RAB9AGAAL3MBTL1PLAU
SCHEMBL18240065 0.75 NPC1 (1.00) NPC1RAB9AGAAL3MBTL1SMN1; SMN2
SCHEMBL2915566 0.75 NPC1 (1.00) NPC1RAB9AGAAL3MBTL1SMN1; SMN2
SCHEMBL1389297 0.75 NPC1 (1.00) NPC1RAB9AGAAL3MBTL1SMN1; SMN2
SCHEMBL30538675 0.75 NPC1 (1.00) NPC1RAB9AGAAL3MBTL1SMN1; SMN2
SCHEMBL8990181 0.73 RAB9A (0.53) NPC1RAB9AGAAL3MBTL1PLAU

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5652327-A Triazine polymers HOECHST AKTIENGESELLSCHAFT (DE) 1997-07-29 — — US claimed
EP-0668529-A2 Triazine polymers HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-23 — — EP claimed
US-5326661-A Photorefractive polymers containing discrete photoconductive and electrooptical units HOECHST CELANESE CORP. (US) 1994-07-05 — — US claimed
US-6864347-B2 Nonlinear optical chiral compounds and devices incorporating same KVH INDUSTRIES, INC. (US) 2005-03-08 — — US disclosed
US-20030161605-A1 Nonlinear optical chiral compounds and devices incorporating same KVH INDUSTRIES, INC. 2003-08-28 — — US disclosed
WO-2003003112-A1 NONLINEAR OPTICAL CHIRAL COMPOUNDS AND DEVICES INCORPORATING SAME KVH INDUSTRIES, INC. (US) 2003-01-09 — — WO disclosed
US-6288206-B1 MIXED WITH DYE; HEAT RESISTANCE, STABILITY; ELECTROOPTICS; MOLECULAR OPTOELECTRONICS CORPORATION 2001-09-11 — — US disclosed
WO-2000054103-A1 CHIRAL POLYMER COMPOSITIONS EXHIBITING NONLINEAR OPTICAL PROPERTIES MOLECULAR OPTOELECTRONICS CORPORATION (US) 2000-09-14 — — WO disclosed
EP-0514786-B1 Hologram recording material, hologram recording device, method of manufacturing the same, and method of hologram recording MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1997-03-19 — — EP disclosed
US-5569565-A Hologram recording material MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-10-29 — — US disclosed
EP-0668529-A2 Triazine polymers HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-23 — — EP disclosed
US-5326661-A Photorefractive polymers containing discrete photoconductive and electrooptical units HOECHST CELANESE CORP. (US) 1994-07-05 — — US disclosed
US-5294684-A Antiscaling agents with vinyl chloride polymers and polyvinyl alcohol with hydroxypropylmethyl cellulose SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-03-15 — — US disclosed
EP-0514786-A2 Hologram recording material, hologram recording device, method of manufacturing the same, and method of hologram recording MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1992-11-25 — — EP disclosed
US-4845174-A REACTOR WITH ANTISCALING COATING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1989-07-04 — — US disclosed
EP-0152765-A2 Disozo dyestuffs, process for their preparation and their use CASSELLA Aktiengesellschaft (DE) 1985-08-28 — — EP disclosed
US-4180634-A USING ZODIDE SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1979-12-25 — — US disclosed
US-4105838-A LAYERS OF METAL COMPLEX WITH ORGANIC COMPOUND OR DYE ON REACTION VESSEL SURFACES, ANTISCALING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1978-08-08 — — US disclosed
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