Biphenyl

Biphenyl

SCHEMBL6131233

FC(F)(F)C(F)(F)C(F)(F)C(F)(F)c1ccc(Br)cc1.S.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
MAPK1 P28482 1/20 0.48
KIF11 P52732 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.37
PTPN5 P54829 2/20 0.37
NPC1 O15118 1/20 0.37
NFKB1 P19838 1/20 0.37
RAB9A P51151 1/20 0.37
NFKB2 Q00653 1/20 0.37
RELA Q04206 1/20 0.37
MAPT P10636 1/20 0.35
BACE1 P56817 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA5A P35218 1/20 0.34
CA9 Q16790 1/20 0.34
MCL1 Q07820 1/20 0.33
AGTR1 P30556 1/20 0.33
NR1H4 Q96RI1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5143771 0.87 CA1 (0.42) ALDH1A1MAPK1CA1CA2CA5A
SCHEMBL1421311 0.85 KIF11 (0.56) ALDH1A1MAPK1KIF11PTPN5BACE1
SCHEMBL7138748 0.85 CA1 (0.41) CA1CA2CA5ACA9TRPV1
SCHEMBL3963219 0.85 CA1 (0.41) CA1CA2CA5ACA9TRPV1
SCHEMBL8769941 0.85 CA1 (0.41) CA1CA2CA5ACA9TRPV1
SCHEMBL669394 0.81 KIF11 (0.60) ALDH1A1MAPK1KIF11PTPN5BACE1
SCHEMBL14577302 0.80 CA1 (0.43) ALDH1A1MAPK1CA1CA2CA5A
SCHEMBL19056952 0.80 CA1 (0.46) ALDH1A1MAPK1TDP1CA1CA2
SCHEMBL3390346 0.78 TSHR (0.50) ALDH1A1MAPK1KIF11PTPN5MAPT
SCHEMBL19056950 0.78 CA1 (0.45) ALDH1A1MAPK1TDP1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050079441-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2005-04-14 US disclosed
EP-1522891-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. (JP) 2005-04-13 EP disclosed