Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA5A | P35218 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8769941 | 0.98 | CA1 (0.41) | CA1CA2CA5ACA9CYP2A6 | |
| SCHEMBL7138748 | 0.98 | CA1 (0.41) | CA1CA2CA5ACA9CYP2A6 | |
| SCHEMBL3963219 | 0.98 | CA1 (0.41) | CA1CA2CA5ACA9CYP2A6 | |
| SCHEMBL14577302 | 0.93 | CA1 (0.43) | CA1CA2CA5ACA9CYP2A6 | |
| SCHEMBL19056952 | 0.93 | CA1 (0.46) | CA1CA2CA5ACA9CYP2A6 | |
| SCHEMBL19056950 | 0.90 | CA1 (0.45) | CA1CA2CA5ACA9CYP2A6 | |
| SCHEMBL5239662 | 0.87 | CA1 (0.46) | CA1CA2CA5ACA9CYP2A6 | |
| Biphenyl SCHEMBL6131233 | 0.87 | ALDH1A1 (0.48) | CA1CA2CA5ACA9TRPV1 | |
| SCHEMBL673282 | 0.85 | LMNA (0.43) | CA1CA2LMNAESR1ESR2 | |
| SCHEMBL663302 | 0.82 | CA1 (0.46) | CA1CA2CA5ACA9CYP2A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7285369-B2 | photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability | FUJIFILM CORPORATION (JP) | 2007-10-23 | — | — | US | disclosed |
| US-20050079441-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-04-14 | — | — | US | disclosed |
| EP-1522891-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-13 | — | — | EP | disclosed |
| EP-1519228-A2 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-03-30 | — | — | EP | disclosed |
| US-20050064329-A1 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-03-24 | — | — | US | disclosed |
| EP-0629205-B1 | INTERMEDIATES FOR THERMALLY STABLE, FLUORINE-CONTAINING POLYSILOXANES AND GLASS FIBER COATED THEREWITH | DU PONT (US) | 1997-09-10 | — | — | EP | disclosed |
| EP-0629205-A1 | THERMALLY STABLE, FLUORINE-CONTAINING ORGANOSILANES. | DU PONT (US) | 1994-12-21 | — | — | EP | disclosed |
| WO-1993020084-A1 | THERMALLY STABLE, FLUORINE-CONTAINING ORGANOSILANES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-10-14 | — | — | WO | disclosed |