SCHEMBL6138643

SCHEMBL6138643

CO[Si](CCOCC[Si](OC)(OC)OC)(OC)OC

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6440852 0.89 LMNA (0.38) LMNA
SCHEMBL909641 0.87 TSHR (0.50)
SCHEMBL1225084 0.87
SCHEMBL12190455 0.87
SCHEMBL1405933 0.85 ALDH1A1 (0.39) LMNA
SCHEMBL28518137 0.84 TSHR (0.46) LMNA
SCHEMBL17784244 0.84 KDM4E (0.34)
SCHEMBL28792480 0.83
SCHEMBL15612295 0.83 CA12 (0.38)
SCHEMBL27607402 0.83 LMNA (0.47) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1058274-B1 Composition for film formation and material for insulating film formation JSR CORP (JP) 2005-07-27 EP disclosed
US-6376634-B1 ORGANOSILICON POLYMERS JSR CORPORATION (JP) 2002-04-23 US disclosed
EP-1058274-A1 Composition for film formation and material for insulating film formation JSR Corporation (JP) 2000-12-06 EP disclosed
US-4966981-A Process for preparing epoxy group-containing silanes TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1990-10-30 US disclosed