SCHEMBL620277

SCHEMBL620277

COC(=O)C(C)(C)C(C)CCCC(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42
PLA2G10 O15496 1/20 0.38
ALDH1A1 P00352 1/20 0.37
FOLH1 Q04609 2/20 0.36
GABRP O00591 2/20 0.35
GABRD O14764 2/20 0.35
GABRA1 P14867 2/20 0.35
GABRB1 P18505 2/20 0.35
GABRG2 P18507 2/20 0.35
GABRB3 P28472 2/20 0.35
GABRA5 P31644 2/20 0.35
GABRA3 P34903 2/20 0.35
GABRA2 P47869 2/20 0.35
GABRB2 P47870 2/20 0.35
GABRA4 P48169 2/20 0.35
GABRE P78334 2/20 0.35
GABRA6 Q16445 2/20 0.35
GABRG1 Q8N1C3 2/20 0.35
GABRG3 Q99928 2/20 0.35
GABRQ Q9UN88 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4605980 0.98 TSHR (0.41) TSHRPLA2G10ALDH1A1FOLH1GABRP
SCHEMBL8645646 0.95 TSHR (0.41) TSHRPLA2G10ALDH1A1ENPEPGSTK1
SCHEMBL22190520 0.93 ALDH1A1 (0.43) TSHRPLA2G10ALDH1A1GSTK1LMNA
Silver SCHEMBL3333401 0.83 CA1 (0.38) NFKB1
Lithium Ion SCHEMBL1100579 0.83 CA1 (0.38) FOLH1NFKB1
SCHEMBL1114582 0.81 CA2 (0.48) LMNA
SCHEMBL9540341 0.81 GABRP (0.40) TSHRALDH1A1FOLH1GABRPGABRD
SCHEMBL22573795 0.80 PRSS1 (0.46) LMNA
SCHEMBL21580900 0.79 TSHR (0.45) TSHRALDH1A1LMNA
SCHEMBL32680456 0.79 ALDH1A1 (0.37) TSHRALDH1A1LMNASLC22A6NFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 478 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11565936-B2 Atomic layer etching on microdevices and nanodevices THE REGENTS OF THE UNIVERSITY OF COLORADO (US) 2023-01-31 US claimed
US-20210292574-A1 PRINT-ON PASTES WITH METAL-BASED ADDITIVES FOR MODIFYING MATERIAL PROPERTIES OF METAL PARTICLE LAYERS SHOWA DENKO MATERIALS CO., LTD. (JP) 2021-09-23 US claimed
EP-3818547-A1 PRINT-ON PASTES WITH METAL-BASED ADDITIVES FOR MODIFYING MATERIAL PROPERTIES OF METAL PARTICLE LAYERS Showa Denko Materials Co., Ltd. (JP) 2021-05-12 EP claimed
US-20200316645-A1 ATOMIC LAYER ETCHING ON MICRODEVICES AND NANODEVICES THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2020-10-08 US claimed
EP-1828431-B1 METHOD FOR PREPARING NANOPARTICLES OF SILVER OR A SILVER ALLOY, DISPERSED ON A SUBSTRATE, BY CHEMICAL VAPOUR DEPOSITION COMMISSARIAT ENERGIE ATOMIQUE (FR) 2020-08-05 EP claimed
EP-1943282-B1 PREPARATION OF AMINO-SILANE TERMINATED POLYMER BY USING ORGANIC BISMUTH CATALYST AND CURED POLYMER THEREFROM BY USING NON-TIN CATALYST MOMENTIVE PERFORMANCE MAT INC (US) 2020-03-04 EP claimed
US-10381227-B2 Methods of atomic layer etching (ALE) using sequential, self-limiting thermal reactions THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2019-08-13 US claimed
EP-1074603-B1 Method and apparatus for producing oxide-nanocrystals LEDVANCE GMBH (DE) 2018-04-04 EP claimed
US-20170365478-A1 NOVEL METHODS OF ATOMIC LAYER ETCHING (ALE) USING SEQUENTIAL, SELF-LIMITING THERMAL REACTIONS THE REGENT OF THE UNIV OF COLORADO A BODY CORPORATE (US) 2017-12-21 US claimed
EP-1325170-B1 FABRICATION OF HIGH CURRENT COATED HIGH TEMPERATURE SUPERCONDUCTING TAPES IGC SUPERPOWER LLC (US) 2014-04-23 EP claimed
WO-1998051837-A2 CHEMICAL VAPOUR DEPOSITION PRECURSORS SECRETARY OF STATE FOR DEFENCE ACTING THROUGH HIS DEFENCE EVALUATION AND RESEARCH AGENCY (GB) 1998-11-19 WO claimed
EP-0586321-B1 Formation of supersaturated rare earth doped semiconductor layers by CVD IBM (US) 1998-05-20 EP claimed
EP-0668105-A2 Olefin production PHILLIPS PETROLEUM COMPANY (US) 1995-08-23 EP claimed
EP-0633265-A1 Process for preparation of beta-cyanoalkylsilanes DOW CORNING CORPORATION (US) 1995-01-11 EP claimed
US-5322813-A Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US claimed
EP-0586321-A2 Supersaturated rare earth doped semiconductor layers by CVD INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-09 EP claimed
US-5283348-A Process for preparation of β-cyanoalkylsilanes DOW CORNING CORPORATION (US) 1994-02-01 US claimed
US-5126469-A Supported catalysts for addition of silicon hydrides to α,β-unsaturated olefinic nitriles DOW CORNING CORPORATION (US) 1992-06-30 US claimed
US-5126468-A Diamine and copper or copper compound DOW CORNING CORPORATION (US) 1992-06-30 US claimed
US-5103033-A Catalytic reaction of unsaturated nitriles and silicon hydride DOW CORNING CORPORATION (US) 1992-04-07 US claimed