⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29136443 | 0.78 | — | — | |
| SCHEMBL4118313 | 0.72 | — | — | |
| SCHEMBL29480058 | 0.71 | — | — | |
| SCHEMBL1073280 | 0.69 | — | — | |
| SCHEMBL466218 | 0.64 | ALDH1A1 (0.35) | — | |
| SCHEMBL29397177 | 0.64 | ALDH1A1 (0.35) | — | |
| SCHEMBL28859502 | 0.64 | ALDH1A1 (0.35) | — | |
| Benzene SCHEMBL28270966 | 0.63 | NAPRT (0.35) | — | |
| SCHEMBL9276325 | 0.62 | KEAP1 (0.41) | — | |
| SCHEMBL7789812 | 0.62 | ALDH1A1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116018364-A | Antimicrobial active energy ray-curable coating composition, coating, antimicrobial member, and article | 东洋油墨SC控股株式会社 | 2023-04-25 | — | — | CN | disclosed |
| CN-115620621-A | Display device and method for manufacturing the same | 三星显示有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-115215994-A | Reactive epoxy carboxylate compound, unsaturated group-containing polycarboxylic acid compound, photosensitive resin composition, and cured product | 日本化药株式会社 | 2022-10-21 | — | — | CN | disclosed |
| CN-114402256-A | Organic film, method for producing same, composition, laminate, and semiconductor device | 富士胶片株式会社 | 2022-04-26 | — | — | CN | disclosed |
| CN-107641191-B | Epoxy carboxylate compound, polycarboxylic acid compound, resin composition, cured product, and article | 日本化药株式会社 | 2021-05-07 | — | — | CN | disclosed |
| CN-107709408-B | Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2020-02-14 | — | — | CN | disclosed |
| EP-1091253-B1 | Plate making process for planographic plate, automatic developing apparatus and recording medium | FUJI PHOTO FILM CO LTD (JP) | 2005-03-30 | — | — | EP | disclosed |
| EP-0642057-B1 | Photosensitive resin composition | HITACHI CHEMICAL CO LTD (JP) | 1998-11-25 | — | — | EP | disclosed |