SCHEMBL6276583

SCHEMBL6276583

CCC1(OC(=O)C2CC3C=CC2C3)CCCC1.CN1C(=O)C=CC1=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.34
HPGD P15428 1/20 0.34
POLB P06746 3/20 0.34
KMT2A Q03164 2/20 0.34
RAB9A P51151 2/20 0.33
LMNA P02545 2/20 0.33
KDM4E B2RXH2 1/20 0.33
APEX1 P27695 1/20 0.32
RECQL P46063 1/20 0.32
BLM P54132 1/20 0.32
ESR2 Q92731 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MAPK1 P28482 2/20 0.32
HSD11B1 P28845 2/20 0.32
MAPT P10636 1/20 0.32
NPC1 O15118 1/20 0.31
NFKB1 P19838 1/20 0.31
NFKB2 Q00653 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6279885 0.91 ALDH1A1 (0.34) ALDH1A1HPGDPOLBKMT2ARAB9A
SCHEMBL3434470 0.88 LMNA (0.41) ALDH1A1HPGDPOLBKMT2ARAB9A
SCHEMBL1410180 0.87 LMNA (0.40) ALDH1A1HPGDPOLBKMT2ARAB9A
SCHEMBL22263664 0.87 LMNA (0.40) ALDH1A1HPGDPOLBKMT2ARAB9A
SCHEMBL13409255 0.87 LMNA (0.40) ALDH1A1HPGDPOLBKMT2ARAB9A
Maleic Anhydride SCHEMBL7262875 0.85 ALDH1A1 (0.35) ALDH1A1HPGDPOLBKMT2ARAB9A
Maleic Anhydride SCHEMBL7262306 0.84 ALDH1A1 (0.34) ALDH1A1HPGDPOLBKMT2ARAB9A
SCHEMBL7269169 0.83 LMNA (0.37) ALDH1A1HPGDPOLBKMT2ARAB9A
Maleic Anhydride SCHEMBL6283020 0.77 ALDH1A1 (0.35) ALDH1A1HPGDPOLBKMT2ARAB9A
SCHEMBL11909235 0.77 ALDH1A1 (0.45) ALDH1A1HPGDPOLBKMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6878501-B2 Fluorinated cyclolefin polymers; radiation transparent, alkali solubility SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-12 US disclosed
US-20020004569-A1 Polymer, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-01-10 US disclosed