Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13409255 | 0.99 | LMNA (0.40) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL22263664 | 0.99 | LMNA (0.40) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL1410180 | 0.99 | LMNA (0.40) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL7269169 | 0.95 | LMNA (0.37) | LMNAKDM4EALDH1A1HPGDPOLB | |
| Maleic Anhydride SCHEMBL7262875 | 0.89 | ALDH1A1 (0.35) | LMNAKDM4EALDH1A1HPGDPOLB | |
| Maleic Anhydride SCHEMBL7262306 | 0.88 | ALDH1A1 (0.34) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL6276583 | 0.88 | ALDH1A1 (0.34) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL11909235 | 0.87 | ALDH1A1 (0.45) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL7667945 | 0.87 | KDM4E (0.37) | LMNAKDM4EALDH1A1HPGDPOLB | |
| SCHEMBL22263835 | 0.86 | ALDH1A1 (0.44) | LMNAKDM4EALDH1A1HPGDPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-6653044-B2 | Addition copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-6579658-B2 | Fluorinated maleic anhydride or maleimide | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-17 | — | — | US | disclosed |
| US-6444396-B1 | ESTER COMPOUND HAVING AN ALKYLCYCLOALKYL OR ALKYLCYCLOALKENYL GROUP AS THE PROTECTIVE GROUP IS PROVIDED AS WELL AS A POLYMER COMPRISING UNITS OF THE ESTER COMPOUND. THE POLYMER IS USED AS A BASE RESIN TO FORMULATE A RESIST COMPOSITION HAVING A HIGHER | SHIN-ETSU CHEMICAL CO. (JP) | 2002-09-03 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010036593-A1 | Chemical amplification type resist composition | SHIN-ETSU CHEMICAL CO., LTD. | 2001-11-01 | — | — | US | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1096318-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| US-6147249-A | ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | LMNA 915/4885KDM4E 1590/4885ALDH1A1 382/4885 |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | CRY1, CBR3, C1S | LMNA 4101/4885KDM4E 3165/4885ALDH1A1 810/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.