⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6297107 | 0.98 | — | — | |
| Acrylic Acid SCHEMBL6298175 | 0.87 | — | — | |
| Methacrylic Acid SCHEMBL6303259 | 0.85 | ALOX15 (0.30) | — | |
| SCHEMBL6298835 | 0.84 | — | — | |
| SCHEMBL6303272 | 0.84 | HCAR2 (0.30) | — | |
| Acrylic Acid Methyl Ester SCHEMBL6303271 | 0.84 | HSD11B1 (0.32) | — | |
| Methacrylic Acid SCHEMBL6297106 | 0.83 | HSD11B1 (0.30) | — | |
| Methacrylic Acid SCHEMBL6297147 | 0.80 | ALDH1A1 (0.37) | — | |
| Acrylic Acid SCHEMBL6298827 | 0.79 | ALDH1A1 (0.39) | — | |
| SCHEMBL43549 | 0.79 | TSHR (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6908729-B2 | Amplified photoresist; radiation with ultraviolet radiation | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20030082486-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-05-01 | — | — | US | disclosed |