Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 2/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid Methyl Ester SCHEMBL6303271 | 0.91 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL215042 | 0.89 | THRB (0.36) | TSHRHPGDTHRBHSD11B1CYP17A1 | |
| SCHEMBL28226531 | 0.89 | TSHR (0.32) | TSHR | |
| Methacrylic Acid SCHEMBL6297106 | 0.87 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL711021 | 0.86 | TSHR (0.40) | TSHRHPGDTHRB | |
| SCHEMBL14580050 | 0.85 | HSD11B1 (0.31) | HSD11B1 | |
| Methacrylic Acid SCHEMBL6303259 | 0.85 | ALOX15 (0.30) | — | |
| SCHEMBL1077901 | 0.85 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL685549 | 0.85 | TSHR (0.36) | TSHRHPGDTHRB | |
| SCHEMBL4400897 | 0.85 | THRB (0.40) | TSHRHPGDTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1421 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118930715-A | Acrylic resin polymer and preparation method and application thereof | 中国科学院宁波材料技术与工程研究所 | 2024-11-12 | — | — | CN | claimed |
| US-12098336-B2 | Drag reducing agent | IRIS TECH, INC. (US) | 2024-09-24 | — | — | US | claimed |
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | claimed |
| CN-117659263-A | Weather-resistant room-temperature-degradable water-soluble photosensitive resin, application and preparation method thereof | 中国地质大学（武汉） | 2024-03-08 | — | — | CN | claimed |
| CN-114544803-B | HPLC analysis method for photoresist resin monomer acrylic ester compound | 河北凯诺中星科技有限公司 | 2023-12-26 | — | — | CN | claimed |
| CN-115536776-B | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| US-20230227740-A1 | DRAG REDUCING AGENT | IRIS TECH INC (US) | 2023-07-20 | — | — | US | claimed |
| WO-2023133363-A2 | DRAG REDUCING AGENT | IRIS TECH, INC. (US) | 2023-07-13 | — | — | WO | claimed |
| US-20230002631-A1 | WATER-WASHABLE COMPOSITIONS FOR USE IN 3D PRINTING | BASF SE (DE) | 2023-01-05 | — | — | US | claimed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | claimed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| US-20100237041-A1 | MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD | KABUSHIKI KAISHA TOSHIBA (JP) | 2010-09-23 | — | — | US | claimed |
| US-20100230384-A1 | ULTRAVIOLET-CURING RESIN MATERIAL FOR PATTERN TRANSFER AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD USING THE SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2010-09-16 | — | — | US | claimed |
| WO-2010080789-A2 | SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY | BREWER SCIENCE INC. (US) | 2010-07-15 | — | — | WO | claimed |
| US-20100170868-A1 | SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY | BREWER SCIENCE INC. (US) | 2010-07-08 | — | — | US | claimed |
| US-7579132-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | claimed |
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-02-21 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| US-6861552-B2 | Adamantyl ester monomer composition | TOKUYAMA CORPORATION (JP) | 2005-03-01 | — | — | US | claimed |
| US-20020155378-A1 | Chemical amplifying type positive resist compositions | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | NHERF1, SLC26A3, HCN3 | TSHR 1310/4885HPGD 4496/4885THRB 1837/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.