Acrylic Acid Methyl Ester

Acrylic Acid Methyl Ester

SCHEMBL6303271

C=CC(=O)O.C=CC(=O)OC.C=CC(=O)OC1(CC)C2CC3CC(C2)CC1C3

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.32
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6303259 0.94 ALOX15 (0.30)
SCHEMBL43549 0.91 TSHR (0.34) HSD11B1
Methacrylic Acid SCHEMBL6297106 0.91 HSD11B1 (0.30) HSD11B1
SCHEMBL6303272 0.85 HCAR2 (0.30) HCAR2
Acrylic Acid Methyl Ester SCHEMBL6303295 0.84 CYP17A1 (0.34) HSD11B1HCAR2
Acrylic Acid SCHEMBL6303263 0.84
Acrylic Acid SCHEMBL6298827 0.81 ALDH1A1 (0.39)
SCHEMBL14580050 0.81 HSD11B1 (0.31) HSD11B1
SCHEMBL215042 0.81 THRB (0.36) HSD11B1
SCHEMBL6297107 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6913873-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-07-05 US disclosed
US-6908729-B2 Amplified photoresist; radiation with ultraviolet radiation MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-06-21 US disclosed
US-20030087194-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-05-08 US disclosed
US-20030082486-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-05-01 US disclosed