SCHEMBL6313100

SCHEMBL6313100

CCc1c(N)ccc(C(CC)c2ccc(N)c(CC)c2CC)c1CC

nearest known ligand 0.32

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 1/20 0.32
NOS3 P29474 1/20 0.31
NOS2 P35228 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
ALDH1A1 P00352 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
HPGD P15428 1/20 0.31
MAPK1 P28482 1/20 0.31
KMT2A Q03164 1/20 0.31
HSD17B10 Q99714 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7126313 0.83 ALDH1A1 (0.32) NOS3NOS2KDM4EMEN1ALDH1A1
Ammonia Solution, Strong SCHEMBL28697649 0.79 GABRA1 (0.38) NOS3NOS2KDM4EMEN1ALDH1A1
SCHEMBL30117633 0.79 NOS3 (0.41) NOS3NOS2KDM4EMEN1ALDH1A1
SCHEMBL215981 0.79 NOS3 (0.41) NOS3NOS2KDM4EMEN1ALDH1A1
Hydrochloric Acid SCHEMBL9640854 0.77 NOS3 (0.39) NOS3NOS2KDM4EMEN1ALDH1A1
Hydrochloric Acid SCHEMBL4662390 0.77 NOS3 (0.39) NOS3NOS2KDM4EMEN1ALDH1A1
SCHEMBL258260 0.76 CALM1 (0.37) GPR84MEN1ALDH1A1MAPTHPGD
Hydroxyamine SCHEMBL28193821 0.74 NOS3 (0.38) NOS3NOS2KDM4EMEN1ALDH1A1
SCHEMBL6310149 0.72 CYP3A4 (0.37) GPR84KDM4EMEN1ALDH1A1POLB
SCHEMBL6313094 0.72 GPR84 (0.30) GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed