SCHEMBL6313825

SCHEMBL6313825

CCc1c(N)ccc(S(=O)(=O)c2ccc(N)c(CC)c2CC)c1CC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.40
CDC25B P30305 1/20 0.36
LMNA P02545 1/20 0.33
CA2 P00918 2/20 0.32
HTR6 P50406 2/20 0.31
THRB P10828 1/20 0.31
POLB P06746 2/20 0.31
ALDH1A1 P00352 2/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
HTT P42858 1/20 0.31
NOS3 P29474 1/20 0.31
NOS2 P35228 1/20 0.31
PKM P14618 1/20 0.31
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CYP2C9 P11712 1/20 0.30
CA4 P22748 1/20 0.30
CA6 P23280 1/20 0.30
CA5A P35218 1/20 0.30
CA7 P43166 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10954398 0.86 CA2 (0.42) GAACA2ALDH1A1PKMCA12
SCHEMBL11593088 0.86 HTR6 (0.53) GAAHTR6POLBALDH1A1PKM
SCHEMBL7597804 0.84 AURKA (0.41) GAACDC25BLMNACA2THRB
SCHEMBL9582611 0.84 TRPV4 (0.37) GAACA2
SCHEMBL27467770 0.82 GAA (0.54) GAACA2HTR6CA12CA1
Sulfuric Acid SCHEMBL1499856 0.80 ALDH1A1 (0.42) GAALMNACA2THRBPOLB
SCHEMBL30117633 0.79 NOS3 (0.41) THRBPOLBALDH1A1L3MBTL1HTT
SCHEMBL215981 0.79 NOS3 (0.41) THRBPOLBALDH1A1L3MBTL1HTT
Sulfuric Acid SCHEMBL28847019 0.78 ALDH1A1 (0.41) GAALMNACA2THRBPOLB
Hydrochloric Acid SCHEMBL4662390 0.77 NOS3 (0.39) GAATHRBPOLBALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
CN-1267501-C Light sensitivity resin precursor compsn. TORAY INDUSTRIES (JP) 2006-08-02 CN disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
CN-1154708-C Chemical-ray sensitive polymer composition 东丽株式会社 2004-06-23 CN disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
CN-1480491-A Light sensitivity resin precursor compsn. ������������ʽ���� 2004-03-10 CN disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
CN-1201061-A Chemical-ray sensitive polymer composition TORAY CO LTD (JP) 1998-12-09 CN disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed