SCHEMBL632477

SCHEMBL632477

C=C(C)C(=O)OCCN(CCC)S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.38
THRB P10828 1/20 0.36
MMP1 P03956 2/20 0.33
MMP2 P08253 2/20 0.33
MMP9 P14780 2/20 0.33
MMP8 P22894 2/20 0.33
MMP13 P45452 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4669429 0.94 TSHR (0.43) TSHRTHRBMMP1MMP2MMP9
SCHEMBL819333 0.91 THRB (0.37) TSHRTHRBMMP1MMP2MMP9
SCHEMBL5872260 0.90 THRB (0.38) TSHRTHRBMMP1MMP2MMP9
SCHEMBL9872283 0.88 TSHR (0.49) TSHRTHRBMMP1MMP2MMP9
SCHEMBL3820632 0.84 THRB (0.36) TSHRTHRBMMP1MMP2MMP9
SCHEMBL31209956 0.84 THRB (0.36) TSHRTHRBMMP1MMP2MMP9
SCHEMBL1931731 0.84 THRB (0.36) TSHRTHRBMMP1MMP2MMP9
SCHEMBL633255 0.83 TSHR (0.40) TSHRTHRBMMP1MMP2MMP9
SCHEMBL4234133 0.82 MMP1 (0.39) TSHRTHRBMMP1MMP2MMP9
SCHEMBL393824 0.82 THRB (0.36) TSHRTHRBMMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020008860-A1 LIQUID WAX FOR RUNWAY SURFACES, AND METHOD FOR MANUFACTURING SAME 林 真子 2020-01-09 WO disclosed
US-9146578-B2 Coating apparatus, method for producing electrophotographic photosensitive member and method for mass-producing electrophotographic photosensitive members CANON KABUSHIKI KAISHA (JP) 2015-09-29 US disclosed
US-8741391-B2 Dip-coating process and method for making electrophotographic photosensitive member CANON KABUSHIKI KAISHA (JP) 2014-06-03 US disclosed
EP-2349590-B1 DIP-COATING PROCESS CANON KK (JP) 2014-01-29 EP disclosed
US-20120045569-A1 COATING APPARATUS, METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND METHOD FOR MASS-PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBERS CANON KABUSHIKI KAISHA (JP) 2012-02-23 US disclosed
EP-2420324-A1 Coating apparatus, method for producing electrophotographic photosensitive member and method for mass-producing electrophotographic photosensitive members Canon Kabushiki Kaisha (JP) 2012-02-22 EP disclosed
US-20110200743-A1 DIP-COATING PROCESS AND METHOD FOR MAKING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER CANON KABUSHIKI KAISHA (JP) 2011-08-18 US disclosed
EP-2349590-A1 DIP-COATING PROCESS AND METHOD FOR MAKING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER Canon Kabushiki Kaisha (JP) 2011-08-03 EP disclosed
WO-2010044475-A1 DIP-COATING PROCESS AND METHOD FOR MAKING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER CANON KABUSHIKI KAISHA (JP) 2010-04-22 WO disclosed
EP-1983372-A1 METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY Canon Kabushiki Kaisha (JP) 2008-10-22 EP disclosed
EP-0595255-B1 Photoelectric sensor, information recording system, and information recording method DAINIPPON PRINTING CO LTD (JP) 2001-03-28 EP disclosed
US-5932301-A COATING A MIXED SOLUTION OF A LIQUID CRYSTAL, A MULTIFUNCTIONAL ULTRAVIOLET CURING RESIN MATERIAL AND A FLUOROCARBON SURFACE-ACTIVE AGENT, AND THEN CURING THE COATING BY ULTRAVIOLET IRRADIATION DAI NIPPON PRINTING CO., LTD. (JP) 1999-08-03 US disclosed
US-5693421-A ELECTRODE LAYER WHICH INCLUDES A LIQUID CRYSTAL PHASE CURED IN AN ULTRAVIOLET CURABLE RESIN PHASE; FLUOROCARBON SURFACE-ACTIVE AGENT DAI NIPPON PRINTING CO., LTD. (JP) 1997-12-02 US disclosed
US-5683838-A USING A DISPERSION TYPE OF LIQUID CRYSTAL DAI NIPPON PRINTING CO., LTD. (JP) 1997-11-04 US disclosed
US-5677063-A RECORDING LAYER INCLUDES A LIQUID CRYSTAL PHASE AND ULTRAVIOLET CURED REISN PHASE; IMPROVED STORAGE DURABILITY, FREE FROM OOZING OF LIQUID CRYSTAL FROM THE SURFACE; NOISE-FEE DAI NIPPON PRINTING CO., LTD. (JP) 1997-10-14 US disclosed
US-5660958-A INCREASED MODULATION, IMPROVED CONTRAST, RESPONSIVENESS DAI NIPPON PRINTING CO., LTD. (JP) 1997-08-26 US disclosed
US-5629920-A Photoelectric sensor, information recording system, and information recording method DAI NIPPON PRINTING CO., LTD. (JP) 1997-05-13 US disclosed
US-5488601-A Photoelectric sensor, information recording system, and information recording method DAI NIPPON PRINTING CO., LTD. (JP) 1996-01-30 US disclosed
EP-0632059-A2 Interpenetrating networks from unsaturated monomers and thermosetting resins SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-01-04 EP disclosed
EP-0595255-A2 Photoelectric sensor, information recording system, and information recording method DAI NIPPON PRINTING CO., LTD. (JP) 1994-05-04 EP disclosed