SCHEMBL6330830

SCHEMBL6330830

O=COC(C1CC2C=CC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14598915 0.78 KDM4E (0.32)
SCHEMBL444687 0.77 USP2 (0.30)
SCHEMBL3363555 0.73 KDM4E (0.34)
SCHEMBL14468507 0.71 LMNA (0.33)
SCHEMBL4398284 0.71 KDM4E (0.33)
SCHEMBL3367444 0.70 KDM4E (0.32)
SCHEMBL4385013 0.70 EPHX2 (0.36)
SCHEMBL200337 0.69 KDM4E (0.32)
SCHEMBL24643274 0.68 LMNA (0.34)
SCHEMBL203770 0.68 LMNA (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6962768-B2 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-11-08 US disclosed
US-20040170919-A1 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same SAMSUNG ELECTRONICS CO. LTD. (KR) 2004-09-02 US disclosed