SCHEMBL6345863

SCHEMBL6345863

O=C(OC1CCCCO1)C1(C(=O)OC2CCCCO2)CC2CCC1C2

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5697624 0.76 EPHX2 (0.39) EPHX2
SCHEMBL5568128 0.74 MAPK1 (0.39) EPHX2
SCHEMBL5562876 0.73 MEN1 (0.35) EPHX2
SCHEMBL8872639 0.72
SCHEMBL5568688 0.72 MEN1 (0.35) EPHX2
SCHEMBL6348493 0.70 MEN1 (0.34) EPHX2
SCHEMBL5568216 0.69 L3MBTL1 (0.37) EPHX2
SCHEMBL6348213 0.69 MEN1 (0.36) EPHX2
SCHEMBL6354331 0.69 MEN1 (0.33)
SCHEMBL7733162 0.69 MEN1 (0.37) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed