Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.52 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | RECQL | P46063 | 1/20 | 0.52 |
| ▸ | GFER | P55789 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 8/20 | 0.51 |
| ▸ | MEN1 | O00255 | 7/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.51 |
| ▸ | GAA | P10253 | 3/20 | 0.51 |
| ▸ | HPGD | P15428 | 3/20 | 0.51 |
| ▸ | USP2 | O75604 | 1/20 | 0.51 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.48 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.48 |
| ▸ | CASP1 | P29466 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5010054 | 0.90 | CYP2A6 (0.53) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL12636510 | 0.89 | PGR (0.48) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL21594521 | 0.89 | ALDH1A1 (0.53) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL21594513 | 0.89 | ALDH1A1 (0.53) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL6716916 | 0.89 | MAPT (0.55) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL5665672 | 0.89 | CYP19A1 (0.47) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL6716922 | 0.89 | MAPT (0.55) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL7466596 | 0.85 | MAPT (0.45) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL7468442 | 0.85 | CYP2A6 (0.42) | ALDH1A1L3MBTL1CYP2A6MAPK1TDP1 | |
| SCHEMBL151232 | 0.83 | CYP2A6 (0.48) | ALDH1A1CYP2A6TSHRMAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-RE35135-E | Dental material; mixture of radical-polymerizable monomer, alpha-ketocarbonyl and aromatic amine | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-12-26 | — | — | US | claimed |
| EP-0136186-B1 | PHOTOCURABLE RESIN COMPOSITION | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1989-09-06 | — | — | EP | claimed |
| US-4548689-A | RADICAL POLYMERIZABLE MONOMER, KETOCARBONYL COMPOUND AND MERCAPTOB | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-10-22 | — | — | US | claimed |
| EP-0136186-A2 | Photocurable resin composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-04-03 | — | — | EP | claimed |
| CN-119431186-A | Preparation method of N-alkylamino substituted benzonitrile compound | 江苏省农药研究所股份有限公司 | 2025-02-14 | — | — | CN | disclosed |
| US-20240181794-A1 | Ink Jet Method And Ink Jet Apparatus | SEIKO EPSON CORP (JP) | 2024-06-06 | — | — | US | disclosed |
| US-11912051-B2 | Ink jet method and ink jet apparatus | SEIKO EPSON CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230407120-A1 | Radiation Curable Ink Jet Composition | SEIKO EPSON CORPORATION (JP) | 2023-12-21 | — | — | US | disclosed |
| US-11787961-B2 | Ink jet process and recording | SEIKO EPSON CORPORATION | 2023-10-17 | — | — | US | disclosed |
| WO-2023189803-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023189799-A1 | SELF CROSS-LINKABLE POLYMER AND RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-11773281-B2 | Ink set and ink jet method | SEIKO EPSON CORPORATION | 2023-10-03 | — | — | US | disclosed |
| EP-0305545-A1 | SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE | Hitachi Chemical Co., Ltd. (JP) | 1989-03-08 | — | — | EP | disclosed |
| EP-0129059-B1 | OXAZOLE DERIVATIVES, PROCESS FOR PRODUCTION THEREOF AND USE THEREOF AS PHOTOCONDUCTIVE MATERIAL | Hitachi Chemical Co., Ltd. (JP) | 1987-01-28 | — | — | EP | disclosed |
| US-4548689-A | RADICAL POLYMERIZABLE MONOMER, KETOCARBONYL COMPOUND AND MERCAPTOB | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-10-22 | — | — | US | disclosed |
| EP-0136186-A2 | Photocurable resin composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-04-03 | — | — | EP | disclosed |
| EP-0129059-A1 | Oxazole derivatives, process for production thereof and use thereof as photoconductive material | Hitachi Chemical Co., Ltd. (JP) | 1984-12-27 | — | — | EP | disclosed |
| US-4196233-A | Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides | CIBA-GEIGY CORPORATION (US) | 1980-04-01 | — | — | US | disclosed |
| US-4028142-A | ON IRON, BORON, SILICON ANDOR GROUP 4B TO 6B METALS BY DECOMPOSITION TO PRODUCE DIFFUSION LAYERS | CIBA-GEIGY CORPORATION (US) | 1977-06-07 | — | — | US | disclosed |
| US-4011173-A | MODIFIED NEMATIC MIXTURES WITH POSITIVE DIELECTRIC ANISOTROPY | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DT) | 1977-03-08 | — | — | US | disclosed |