SCHEMBL648491

SCHEMBL648491

COCc1ccccc1COC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 5/20 0.44
PDK2 Q15119 1/20 0.42
MEN1 O00255 2/20 0.40
ALDH1A1 P00352 2/20 0.40
KMT2A Q03164 2/20 0.40
HTT P42858 2/20 0.40
NPSR1 Q6W5P4 2/20 0.40
TSHR P16473 1/20 0.40
PRKCE Q02156 2/20 0.39
MYLK Q15746 2/20 0.39
PRKCG P05129 1/20 0.39
MAPT P10636 1/20 0.39
PRKCA P17252 1/20 0.39
APEX1 P27695 1/20 0.39
RECQL P46063 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
CASP1 P29466 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8459673 0.89 GABRA1 (0.42) IDO1PDK2ALDH1A1HTTNPSR1
SCHEMBL5695153 0.87 IDO1 (0.41) IDO1PDK2MEN1ALDH1A1KMT2A
SCHEMBL22711438 0.87 IDO1 (0.40) IDO1PDK2MEN1ALDH1A1KMT2A
SCHEMBL18055973 0.87 IDO1 (0.40) IDO1PDK2MEN1ALDH1A1KMT2A
Phenol SCHEMBL4103629 0.87 TDP1 (0.52) IDO1PDK2MEN1ALDH1A1KMT2A
SCHEMBL23480864 0.87 IDO1 (0.63) IDO1
SCHEMBL3136304 0.87 PDK2 (0.40) IDO1PDK2MEN1ALDH1A1KMT2A
SCHEMBL4979415 0.87 ALDH1A1 (0.38) IDO1PDK2MEN1ALDH1A1KMT2A
SCHEMBL3922216 0.87 IDO1 (0.40) IDO1PDK2MEN1ALDH1A1KMT2A
SCHEMBL4486648 0.87 IDO1 (0.61) IDO1PDK2MEN1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 278 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11377570-B2 Ink composition for organic light emitting device LG CHEM, LTD. 2022-07-05 US claimed
US-20200308435-A1 Ink Composition for Organic Light Emitting Device LG CHEM, LTD. (KR) 2020-10-01 US claimed
US-9494867-B2 Rinsing liquid for lithography and pattern forming method using same AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-11-15 US claimed
US-20160109805-A1 RINSING LIQUID FOR LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2016-04-21 US claimed
EP-0668322-A1 Liquid epoxy resin compositions for sealing MITSUI TOATSU CHEMICALS, Inc. (JP) 1995-08-23 EP claimed
US-20260117017-A1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2026-04-30 US disclosed
US-12613465-B2 Photosensitive resin composition and method for producing cured relief pattern ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-04-28 US disclosed
EP-4692159-A1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF Nippon Kayaku Kabushiki Kaisha (JP) 2026-02-11 EP disclosed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
US-20250264801-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-08-21 US disclosed
EP-4596608-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-4597225-A1 FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-0164705-A2 Process for manufacturing phthalaldehydacetals BASF Aktiengesellschaft (DE) 1985-12-18 EP disclosed
EP-0164059-A2 Polymers having perfluoroalkyl groups, reproducing layers containing them, and their use in non-aqueous offset printing HOECHST AKTIENGESELLSCHAFT (DE) 1985-12-11 EP disclosed
EP-0053937-B1 POLYNUCLEAR FUSED AROMATIC RING TYPE POLYMER AND PREPARATION THEREOF Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1985-06-19 EP disclosed
EP-0131780-A1 Light-sensitive composition and reproduction material prepared thereof HOECHST AKTIENGESELLSCHAFT (DE) 1985-01-23 EP disclosed
US-4463162-A POLYESTERS FROM ANTHRACENEDIOL ASAHI-DOW LIMITED (JP) 1984-07-31 US disclosed
EP-0053937-A1 Polynuclear fused aromatic ring type polymer and preparation thereof Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1982-06-16 EP disclosed
US-4301088-A Method of preparing benzyl alcohols by decarbonylation of formic acid esters DYNAMIT NOBEL AG (DE) 1981-11-17 US disclosed
US-3947471-A CHROMOGENIC SUMITOMO CHEMICAL COMPANY, LTD. (JA) 1976-03-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12613465-B2 Photosensitive resin composition and method for producing cured relief pattern ARCN1, GLRA1, PSMA1 IDO1 2906/4885PDK2 4601/4885MEN1 3372/4885
US-20260117017-A1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF ASIC1, TNF, WIZ IDO1 4447/4885PDK2 4677/4885MEN1 1610/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.