Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.44 |
| ▸ | TTR | P02766 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | PDE5A | O76074 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | GUSB | P08236 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | RXFP1 | Q9HBX9 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.40 |
| ▸ | STAT3 | P40763 | 1/20 | 0.40 |
| ▸ | NCOA2 | Q15596 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29366362 | 0.84 | L3MBTL1 (0.43) | NPSR1L3MBTL1MEN1KMT2APOLB | |
| SCHEMBL268758 | 0.84 | L3MBTL1 (0.43) | NPSR1L3MBTL1MEN1KMT2APOLB | |
| SCHEMBL29353355 | 0.82 | ALDH1A1 (0.47) | NPSR1L3MBTL1KDM4EHSD17B10SMN1; SMN2 | |
| SCHEMBL649415 | 0.82 | ALDH1A1 (0.47) | NPSR1L3MBTL1KDM4EHSD17B10SMN1; SMN2 | |
| SCHEMBL8411496 | 0.76 | L3MBTL1 (0.36) | NPSR1L3MBTL1MEN1KMT2AKDM4E | |
| SCHEMBL26105184 | 0.76 | ALDH1A1 (0.50) | NPSR1TTRL3MBTL1PDE5AMEN1 | |
| SCHEMBL10361466 | 0.76 | ALOX5 (0.49) | L3MBTL1POLBKDM4EHSD17B10ALDH1A1 | |
| SCHEMBL9566491 | 0.76 | DHFR (0.55) | NPSR1TTRL3MBTL1PDE5AMEN1 | |
| SCHEMBL7149339 | 0.76 | NCF1 (0.42) | L3MBTL1MEN1KMT2AKDM4ESMN1; SMN2 | |
| SCHEMBL11023945 | 0.75 | S1PR1 (0.40) | NPSR1L3MBTL1MEN1KMT2AGUSB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3603954-B1 | POLYMER SUBSTRATE WITH HARD COAT LAYER | TEIJIN LTD (JP) | 2024-03-20 | — | — | EP | disclosed |
| US-11866564-B2 | Polymer substrate with hard coat layer | TEIJIN LIMITED (JP) | 2024-01-09 | — | — | US | disclosed |
| US-11370888-B2 | Silicon-rich silsesquioxane resins | DOW SILICONES CORPORATION (US) | 2022-06-28 | — | — | US | disclosed |
| EP-3354455-B1 | POLYMER SUBSTRATE WITH HARDCOAT LAYER, AND MANUFACTURING METHOD FOR SAME | TEIJIN LTD (JP) | 2022-02-09 | — | — | EP | disclosed |
| US-11028284-B2 | Polymer substrate with hardcoat layer, and manufacturing method for same | TEIJIN LIMITED (JP) | 2021-06-08 | — | — | US | disclosed |
| US-20210008851-A1 | METHOD FOR PRODUCING SUBSTRATE HAVING HARD COAT LAYER CONTAINING FUNCTIONAL FINE PARTICLES | TEIJIN LIMITED (JP) | 2021-01-14 | — | — | US | disclosed |
| EP-3753974-A1 | METHOD FOR PRODUCING SUBSTRATE HAVING HARD COAT LAYER CONTAINING FUNCTIONAL FINE PARTICLES | Teijin Limited (JP) | 2020-12-23 | — | — | EP | disclosed |
| US-20200377682-A1 | POLYMER SUBSTRATE WITH HARD COAT LAYER | TEIJIN LIMITED (JP) | 2020-12-03 | — | — | US | disclosed |
| EP-3603954-A1 | POLYMER SUBSTRATE WITH HARD COAT LAYER | Teijin Limited (JP) | 2020-02-05 | — | — | EP | disclosed |
| US-20190211155-A1 | SILICON-RICH SILSESQUIOXANE RESINS | DOW SILICONES CORPORATION | 2019-07-11 | — | — | US | disclosed |
| US-20180196169-A1 | HARD-COATING FILM FOR DISPLAY DEVICE, AND DISPLAY DEVICE COMPRISING SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-07-12 | — | — | US | disclosed |
| EP-3315545-A1 | HARD-COATING FILM FOR DISPLAY DEVICE, AND DISPLAY DEVICE COMPRISING SAME | Samsung Electronics Co., Ltd. (KR) | 2018-05-02 | — | — | EP | disclosed |
| EP-2657263-B1 | PROCESS FOR PRODUCTION OF DISPERSION, DISPERSION, COATING MATERIAL, COATING FILM, AND FILM | DAINIPPON INK & CHEMICALS (JP) | 2015-09-30 | — | — | EP | disclosed |
| US-20140004367-A1 | METHOD FOR PRODUCING DISPERSION, DISPERSION, COATING MATERIAL, COATING FILM, AND FILM | DIC CORPORATION (JP) | 2014-01-02 | — | — | US | disclosed |
| EP-2657263-A1 | PROCESS FOR PRODUCTION OF DISPERSION, DISPERSION, COATING MATERIAL, COATING FILM, AND FILM | DIC Corporation (JP) | 2013-10-30 | — | — | EP | disclosed |
| US-7666920-B2 | urable molding material an epoxy (meth)acrylate, acrylated polyethers;acrylated bisphenol, and a thermoplastic resin; shape recovering; shape retension; adhesion tosubstrate; high refractive index without a decrease in elastic modulus;Fresnel lens sheet | DAI NIPPON INK AND CHEMICALS, INC. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-20060189706-A1 | Actinic-energy-ray-curable resin composition for lens sheet and lens sheet | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1308471-B1 | Radiation curable resin composition for Fresnel lens and Fresnel lens sheet | DAINIPPON INK & CHEMICALS (JP) | 2005-12-14 | — | — | EP | disclosed |
| US-6809889-B2 | EPOXY (METH)ACRYLATE; (METH)ACRYLATE OF LOW MOLECULAR WEIGHT POLYOXYPROPYLENE; CYCLIC (METH)ACRYLATE (E.G., PHENOXYETHYL ACRYLATE) AND (METH)ACRYLATE OF TRIS(HYDROXYALKYL) ISOCYANURATE; HIGH ELASTIC MODULUS AND REFRACTIVE INDEX | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-20030113544-A1 | Radiation curable resin composition for fresnel lens and fresnel lens sheet | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-06-19 | — | — | US | disclosed |