Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6130023 | 0.86 | CHRM1 (0.32) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL6130025 | 0.85 | SLC6A3 (0.35) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL2850328 | 0.80 | TSHR (0.36) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL445367 | 0.73 | HDAC1 (0.37) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL809303 | 0.72 | ALDH1A1 (0.40) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL442955 | 0.71 | CHRM1 (0.36) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| Acrylic Acid SCHEMBL27998566 | 0.71 | LMNA (0.40) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL3966436 | 0.71 | TSHR (0.42) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL10881602 | 0.71 | TSHR (0.33) | CHRM1AKR1A1CHRM3HTR2AHTR2C | |
| SCHEMBL4666561 | 0.70 | LMNA (0.46) | TDP1TSHRCYP3A4NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9470977-B2 | Composition for lithographic printing plate and lithographic printing plate precursor | EASTMAN KODAK COMPANY (US) | 2016-10-18 | — | — | US | disclosed |
| EP-2909676-B1 | COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE PRECURSOR | EASTMAN KODAK CO (US) | 2016-08-24 | — | — | EP | disclosed |
| EP-2794274-B1 | POSITIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PROCESS FOR PREPARING LITHOGRAPHIC PRINTING PLATE | EASTMAN KODAK CO (US) | 2016-04-27 | — | — | EP | disclosed |
| US-9250524-B2 | Positive working lithographic printing plate precursor and process for preparing lithographic printing plate | EASTMAN KODAK COMPANY (US) | 2016-02-02 | — | — | US | disclosed |
| EP-2909676-A1 | COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE PRECURSOR | Eastman Kodak Company (US) | 2015-08-26 | — | — | EP | disclosed |
| US-20150198884-A1 | COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE PRECURSOR | BANK OF AMERICA, N.A., AS AGENT | 2015-07-16 | — | — | US | disclosed |
| US-20140349234-A1 | POSITIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PROCESS FOR PREPARING LITHOGRAPHIC PRINTING PLATE | BANK OF AMERICA, N.A. | 2014-11-27 | — | — | US | disclosed |
| EP-2794274-A1 | POSITIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PROCESS FOR PREPARING LITHOGRAPHIC PRINTING PLATE | Eastman Kodak Company (US) | 2014-10-29 | — | — | EP | disclosed |
| WO-2014061463-A1 | COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE PRECURSOR | EASTMAN KODAK COMPANY (US) | 2014-04-24 | — | — | WO | disclosed |
| US-8524116-B2 | Multilayer sheet containing optically anisotropic layer containing liquid crystal compound and cellulose ester with polymer | FUJIFILM CORPORATION (JP) | 2013-09-03 | — | — | US | disclosed |
| US-20030170559-A1 | Image forming layer containing a fluorine macromolecule having a structural unit derived from monomer containing a double bond, and a hydroxy group, and also contains a polyoxyalkylene acrylate or methacrylate monomer | FUJI PHOTO FILM CO., LTD. | 2003-09-11 | — | — | US | disclosed |
| EP-0989463-B1 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern | FUJI PHOTO FILM CO LTD (JP) | 2003-04-16 | — | — | EP | disclosed |
| US-6399269-B2 | MIXTURE OF POLYMER AND DYE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-06-04 | — | — | US | disclosed |
| US-20020015909-A1 | BOTTOM ANTI-REFLECTIVE COATING MATERIAL COMPOSITION FOR PHOTORESIST AND METHOD OF FORMING RESIST PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2002-02-07 | — | — | US | disclosed |
| EP-0851300-B1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO LTD (JP) | 2001-10-24 | — | — | EP | disclosed |
| US-6165684-A | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| EP-0989463-A2 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-29 | — | — | EP | disclosed |
| EP-0851300-A1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1998-07-01 | — | — | EP | disclosed |
| US-5677101-A | CONTAINING AN O-QUINONEDIAZIDE COMPOUND | KONICA CORPORATION (JP) | 1997-10-14 | — | — | US | disclosed |
| US-4500620-A | UNITS OF AN ETHOXY ACRYLIC ESTER AND AN ACRYLONITRILE | FUJI PHOTO FILM CO., LTD. (JP) | 1985-02-19 | — | — | US | disclosed |