Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARL | Q9H300 | 4/20 | 1.00 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.65 |
| ▸ | MAPT | P10636 | 4/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.65 |
| ▸ | HPGD | P15428 | 2/20 | 0.65 |
| ▸ | MEN1 | O00255 | 4/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
| ▸ | VDR | P11473 | 2/20 | 0.50 |
| ▸ | MMP2 | P08253 | 1/20 | 0.46 |
| ▸ | F2 | P00734 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL65876 | 0.92 | PARL (0.86) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL12339094 | 0.90 | PARL (0.81) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL7973261 | 0.89 | PARL (1.00) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL22251627 | 0.86 | PARL (0.76) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL452440 | 0.82 | PARL (0.70) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL22251877 | 0.81 | PARL (0.68) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL64214 | 0.81 | PARL (0.68) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL8490590 | 0.81 | PARL (0.68) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL1607770 | 0.81 | PARL (0.68) | PARLALDH1A1KMT2AMAPTKDM4E | |
| SCHEMBL498754 | 0.80 | PARL (0.67) | PARLALDH1A1KMT2AMAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 874 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-12528893-B2 | Curable composition | THREEBOND CO., LTD. (JP) | 2026-01-20 | — | — | US | disclosed |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675357-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-4396708-A | Photographic light-sensitive material containing antistatic acid polymer | FUJI PHOTO FILM CO., LTD. (JP) | 1983-08-02 | — | — | US | disclosed |
| EP-0015518-B1 | METHOD FOR IMMUNOLOGICAL ANALYSIS OF TRACE COMPONENTS | FUJI PHOTO FILM CO., LTD. (JP) | 1983-07-20 | — | — | EP | disclosed |
| EP-0015519-B1 | METHOD FOR IMMUNOLOGICAL ANALYSIS | FUJI PHOTO FILM CO., LTD. (JP) | 1983-04-13 | — | — | EP | disclosed |
| US-4337063-A | PHOTOCHEMICAL METHOD | FUJI PHOTO FILM CO., LTD. (JP) | 1982-06-29 | — | — | US | disclosed |
| US-4331444-A | Competitive immunoassay using silver halide fogging agent | FUJI PHOTO FILM CO., LTD. (JP) | 1982-05-25 | — | — | US | disclosed |
| EP-0015519-A1 | Method for immunological analysis | FUJI PHOTO FILM CO., LTD. (JP) | 1980-09-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | PARL 1432/4885ALDH1A1 841/4885KMT2A 536/4885 |
| US-12528893-B2 | Curable composition | SMARCD1, ASH2L, AS3MT | PARL 4276/4885ALDH1A1 487/4885KMT2A 1267/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.