Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MCL1 known ✓ | Q07820 | 1/20 | 0.50 |
| ▸ | ERCC1 | P07992 | 2/20 | 0.79 |
| ▸ | FEN1 | P39748 | 2/20 | 0.79 |
| ▸ | ERCC4 | Q92889 | 2/20 | 0.79 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.56 |
| ▸ | HPGD | P15428 | 5/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.56 |
| ▸ | MEN1 | O00255 | 4/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.56 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.51 |
| ▸ | CES2 | O00748 | 1/20 | 0.50 |
| ▸ | BCHE | P06276 | 1/20 | 0.50 |
| ▸ | CES1 | P23141 | 1/20 | 0.50 |
| ▸ | HEXA | P06865 | 2/20 | 0.49 |
| ▸ | HEXB | P07686 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29410043 | 0.89 | ERCC1 (1.00) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL132760 | 0.89 | ERCC1 (1.00) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| Methane SCHEMBL20512282 | 0.87 | ERCC1 (0.96) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL43565 | 0.87 | ERCC1 (0.96) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL4888025 | 0.87 | ERCC1 (0.96) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL27984890 | 0.87 | ERCC1 (0.96) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| Trifluoromethanesulfonic Acid SCHEMBL51719 | 0.85 | ERCC1 (0.71) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL6761575 | 0.83 | ERCC1 (0.69) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL66140 | 0.83 | ERCC1 (0.50) | ERCC1FEN1ERCC4ALDH1A1KDM4E | |
| SCHEMBL1051383 | 0.80 | ERCC1 (0.58) | ERCC1FEN1ERCC4ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 383 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112094232-B | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2022-04-08 | — | — | CN | claimed |
| CN-112094232-A | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2020-12-18 | — | — | CN | claimed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| CN-108693713-B | Resist underlayer film material, pattern formation method, and resist underlayer film formation method | 信越化学工业株式会社 | 2022-06-03 | — | — | CN | disclosed |
| CN-112094232-B | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2022-04-08 | — | — | CN | disclosed |
| CN-112094232-B | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2022-04-08 | — | — | CN | disclosed |
| CN-112094232-B | Synthesis method of N-hydroxynaphthalimide mesylate | 河北凯力昂生物科技有限公司 | 2022-04-08 | — | — | CN | disclosed |
| CN-106103396-B | Compound, resin, material for forming underlayer film for lithography, pattern formation method, and method for purifying compound or resin | 三菱瓦斯化学株式会社 | 2021-11-30 | — | — | CN | disclosed |
| CN-108693705-B | Resist underlayer film material, pattern formation method, and resist underlayer film formation method | 信越化学工业株式会社 | 2021-07-13 | — | — | CN | disclosed |
| CN-107848983-B | Compound, resin, material for forming underlayer film for lithography, resist pattern, method for forming circuit pattern, and method for purifying resist pattern | 三菱瓦斯化学株式会社 | 2021-07-09 | — | — | CN | disclosed |
| CN-113039177-A | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-06-25 | — | — | CN | disclosed |
| US-6284429-B1 | FOR FORMULATING PHOTORESISTS HAVING SENSITIVITY, RESOLUTION, ETCHING RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-04 | — | — | US | disclosed |
| US-6280898-B1 | PHOTORESISTS PATTERNS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1096318-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-1096317-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-1085377-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1053985-A1 | Resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2000-11-22 | — | — | EP | disclosed |
| US-6147249-A | ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-14 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |