Potassium Ion

Potassium Ion

SCHEMBL6534824

CCCCOS(=O)(=O)[O-].[K+]

nearest known ligand 0.75

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.75
RECQL P46063 2/20 0.75
GLA P06280 1/20 0.75
HPGD P15428 1/20 0.75
MAPK1 P28482 1/20 0.75
EPHX2 P34913 1/20 0.75
BLM P54132 1/20 0.75
CA1 P00915 12/20 0.56
CA2 P00918 12/20 0.56
CA9 Q16790 9/20 0.48
CA12 O43570 4/20 0.46
CA7 P43166 4/20 0.46
CA14 Q9ULX7 3/20 0.46
CA3 P07451 2/20 0.46
CA4 P22748 2/20 0.46
CA6 P23280 2/20 0.46
CA5A P35218 2/20 0.46
CA5B Q9Y2D0 2/20 0.46
ALDH1A1 P00352 2/20 0.40
KDM4E B2RXH2 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17456497 0.95 TSHR (0.75) TSHRRECQLGLAHPGDMAPK1
Lithium Ion SCHEMBL17456624 0.95 TSHR (0.75) TSHRRECQLGLAHPGDMAPK1
Zinc Ion SCHEMBL31471926 0.95 TSHR (0.75) TSHRRECQLGLAHPGDMAPK1
SCHEMBL2634750 0.95
SCHEMBL302087 0.95 TSHR (0.83) TSHRRECQLGLAHPGDMAPK1
Ammonia Solution, Strong SCHEMBL635965 0.93 TSHR (0.72) TSHRRECQLGLAHPGDMAPK1
Amylosulfuric Acid SCHEMBL2543259 0.93 RECQL (0.87) TSHRRECQLGLAHPGDMAPK1
Potassium Ion SCHEMBL10599158 0.91 RECQL (0.91) TSHRRECQLGLAHPGDMAPK1
Potassium Ion SCHEMBL10599511 0.91 RECQL (0.91) TSHRRECQLGLAHPGDMAPK1
Potassium Ion SCHEMBL379323 0.91 RECQL (0.91) TSHRRECQLGLAHPGDMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0518872-A1 TOPICAL FORMULATION OF CYCLOSPORINE THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1992-12-23 EP claimed
WO-1992011860-A1 TOPICAL FORMULATION OF CYCLOSPORINE THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1992-07-23 WO claimed
US-4996193-A Combined topical and systemic method of administration of cyclosporine THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1991-02-26 US claimed
US-20250109535-A1 ANTI-STATIC FLASH SPINNING COMPOSITE NON-WOVEN FABRIC AND PREPARATION METHOD THEREOF DAWNSENS NEW MAT XIAMEN CO LTD (CN) 2025-04-03 US disclosed
EP-4524309-A1 ANTISTATIC FLASH-SPUN COMPOSITE NON-WOVEN FABRIC AND PREPARATION METHOD THEREFOR Dawnsens New Materials (Xiamen) Co., Ltd. (CN) 2025-03-19 EP disclosed
WO-2024060545-A1 ANTISTATIC FLASH-SPUN COMPOSITE NON-WOVEN FABRIC AND PREPARATION METHOD THEREFOR 厦门当盛新材料有限公司 2024-03-28 WO disclosed
CN-115323628-B Antistatic flash-spun composite non-woven fabric and preparation method thereof 厦门当盛新材料有限公司 2024-02-27 CN disclosed
CN-115323628-A Antistatic flash-spun composite non-woven fabric and preparation method thereof 厦门当盛新材料有限公司 2022-11-11 CN disclosed
CN-105056459-A Peanut protein foam extinguishing agent ANHUI TIANYUAN FIRE PROT TECHNOLOGY CO LTD 2015-11-18 CN disclosed
EP-1102821-A4 COMPOSITION AND METHOD FOR POLISHING IN METAL CMP RODEL INC (US) 2004-05-19 EP disclosed
US-6699299-B2 INHIBITING REMOVAL OF SILICON DIOXIDE DURING METAL LAYER REMOVAL BY BONDING WITH ORGANIC POLYMER RODEL HOLDINGS, INC. 2004-03-02 US disclosed
US-20030181046-A1 Composition and method for polishing in metal CMP ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2003-09-25 US disclosed
US-6616717-B2 Containing an oxidizer for oxidizing the metal, a metal complexing compound, and a polymer to bond with silanol surface groups on the silica to inhibit its removal during removal of the layer of metal by the polishing. RODEL HOLDINGS, INC. 2003-09-09 US disclosed
US-20010024933-A1 Composition and method for polishing in metal CMP ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2001-09-27 US disclosed
EP-1102821-A1 COMPOSITION AND METHOD FOR POLISHING IN METAL CMP Rodel Holdings, Inc. (US) 2001-05-30 EP disclosed
WO-1999064527-A1 COMPOSITION AND METHOD FOR POLISHING IN METAL CMP RODEL HOLDINGS, INC. (US) 1999-12-16 WO disclosed
EP-0518872-A1 TOPICAL FORMULATION OF CYCLOSPORINE THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1992-12-23 EP disclosed
WO-1992011860-A1 TOPICAL FORMULATION OF CYCLOSPORINE THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1992-07-23 WO disclosed
US-4996193-A Combined topical and systemic method of administration of cyclosporine THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1991-02-26 US disclosed
US-4857402-A Magnetic recording medium FUJI PHOTO FILM CO., LTD. (JP) 1989-08-15 US disclosed