SCHEMBL6536487

SCHEMBL6536487

Cc1ccc(CC(=O)[O-])cc1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.50
TDP1 Q9NUW8 1/20 0.50
KMT2A Q03164 4/20 0.45
MEN1 O00255 3/20 0.45
SMN1; SMN2 Q16637 3/20 0.45
CTBP2 P56545 1/20 0.45
CES2 O00748 2/20 0.44
CES1 P23141 2/20 0.44
CNR1 P21554 1/20 0.43
CNR2 P34972 1/20 0.43
LMNA P02545 1/20 0.42
FNTA P49354 1/20 0.42
FNTB P49356 1/20 0.42
PSMB8 P28062 1/20 0.41
PSMB5 P28074 1/20 0.41
PLAAT3 P53816 1/20 0.41
PLAAT5 Q96KN8 1/20 0.41
PLAAT2 Q9NWW9 1/20 0.41
PLAAT4 Q9UL19 1/20 0.41
NPC1 O15118 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4962898 0.83 ALDH1A1 (0.49) L3MBTL1SMN1; SMN2CTBP2CES2CES1
SCHEMBL12770093 0.82 L3MBTL1 (0.54) L3MBTL1TDP1KMT2AMEN1SMN1; SMN2
SCHEMBL4444929 0.81 CTBP2 (0.52) L3MBTL1TDP1KMT2AMEN1SMN1; SMN2
Potassium Ion SCHEMBL4444178 0.81 CTBP2 (0.52) L3MBTL1TDP1KMT2AMEN1SMN1; SMN2
Zinc Ion SCHEMBL388577 0.81 CTBP2 (0.52) L3MBTL1TDP1KMT2AMEN1SMN1; SMN2
SCHEMBL8978816 0.81 CTBP2 (0.52) L3MBTL1TDP1KMT2AMEN1SMN1; SMN2
SCHEMBL4444696 0.81 CTBP2 (0.52) L3MBTL1TDP1KMT2AMEN1SMN1; SMN2
4-Methylbenzoic Acid SCHEMBL106217 0.79 CA2 (0.52) KMT2AMEN1SMN1; SMN2CES2CES1
SCHEMBL5414861 0.78 POLB (0.46) L3MBTL1TDP1KMT2AMEN1CES2
Propionic Acid SCHEMBL104393 0.77 CES2 (0.47) L3MBTL1SMN1; SMN2CES2CES1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6727036-B2 COMPRISING A RESIN HAVING AN ACID-DECOMPOSING GROUP WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE ALKALI SOLUBILITY, COMPOUNDS GENERATE ACID BY IRRIADIATION OF ACTIVE LIGHT (ONE CONTRIBUTES DECOMPOSITION OTHER DOES NOT), SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20010033993-A1 Positive-working radiation-sensitive composition FUJIFILM CORPORATION (JP) 2001-10-25 US disclosed