SCHEMBL6540268

SCHEMBL6540268

C=CC(CCCOCCCC(C=C)Cc1ccccc1)Cc1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.37
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
SLC6A2 P23975 2/20 0.33
TAAR1 Q96RJ0 2/20 0.33
TEAD3 Q99594 1/20 0.33
TSHR P16473 1/20 0.33
MAOA P21397 1/20 0.33
SLC6A4 P31645 1/20 0.33
SLC6A3 Q01959 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
CYP2A6 P11509 1/20 0.33
ADORA2A P29274 1/20 0.33
ADORA1 P30542 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33
MMP13 P45452 1/20 0.33
HDAC3 O15379 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC7 Q8WUI4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6541586 0.93 EPHX1 (0.35) EPHX1MEN1KMT2ASLC6A2TAAR1
SCHEMBL6541327 0.93 EPHX1 (0.35) EPHX1MEN1KMT2ASLC6A2TAAR1
SCHEMBL9804098 0.89 EPHX1 (0.39) EPHX1MEN1KMT2ASLC6A2TAAR1
Ethylene SCHEMBL28202425 0.86 L3MBTL1 (0.39) TEAD3TSHRMMP1MMP3
SCHEMBL14690339 0.81 CSNK1E (0.44) SLC6A2TAAR1MAOASLC6A4SLC6A3
SCHEMBL28419255 0.81 LMNA (0.38) EPHX1SLC6A2TAAR1MAOASLC6A4
SCHEMBL28412522 0.78 EPHX1 (0.40) EPHX1MEN1KMT2ASLC6A2TAAR1
SCHEMBL19153950 0.77 TRPA1 (0.41) EPHX1SLC6A2TAAR1TSHRMAOA
SCHEMBL19153099 0.77 TDP1 (0.40) EPHX1SLC6A2TAAR1TSHRMAOA
SCHEMBL22881112 0.76 MMP13 (0.36) MEN1KMT2AHRH3MMP13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114846032-A Radical polymerizable resin composition and cured product thereof 昭和电工株式会社 2022-08-02 CN disclosed
CN-114829432-A Radical polymerizable resin composition and cured product thereof 昭和电工株式会社 2022-07-29 CN disclosed
CN-114685745-A Urethane (meth) acrylate and method for producing urethane (meth) acrylate resin 昭和电工株式会社 2022-07-01 CN disclosed
CN-109071777-B Composition for carbon fiber-reinforced resin, carbon fiber-reinforced resin composition, and cured product 昭和电工株式会社 2022-06-10 CN disclosed
CN-109863179-B Radical polymerizable resin composition 昭和电工株式会社 2021-11-16 CN disclosed
CN-107531813-B Radically polymerizable aqueous resin composition, method for curing same, and method for producing radically polymerizable aqueous resin composition 昭和电工株式会社 2020-06-26 CN disclosed
CN-107663260-B Polymer, and ion exchange membrane and structure reinforced membrane material containing same 财团法人工业技术研究院 2020-06-09 CN disclosed
CN-107663260-A Polymer, and ion exchange membrane and structure reinforced membrane material containing same 财团法人工业技术研究院 2018-02-06 CN disclosed
US-20180030187-A1 POLYMER, ION EXCHANGE MEMBRANE AND STRUCTURAL ENHANCED MEMBRANE EMPLOYING THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2018-02-01 US disclosed
US-20040001961-A1 Curable resin composition useful for coating, multi-layer printed wiring board, printed wiring board and dry film TAMURA KAKEN CORPORATION (JP) 2004-01-01 US disclosed