Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | CA3 | P07451 | 1/20 | 0.46 |
| ▸ | CA4 | P22748 | 1/20 | 0.46 |
| ▸ | CA6 | P23280 | 1/20 | 0.46 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
| ▸ | CA7 | P43166 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.46 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.46 |
| ▸ | KIF18A | Q8NI77 | 1/20 | 0.45 |
| ▸ | FLT1 | P17948 | 1/20 | 0.44 |
| ▸ | FLT4 | P35916 | 1/20 | 0.44 |
| ▸ | KDR | P35968 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4076634 | 0.86 | HTR6 (0.55) | TDP1ALDH1A1CA12CA1CA2 | |
| SCHEMBL9412338 | 0.79 | ALDH1A1 (0.56) | TDP1ALDH1A1CYP3A4MAPK1CA12 | |
| SCHEMBL250144 | 0.79 | ALDH1A1 (0.80) | TDP1ALDH1A1CYP3A4MAPK1CA12 | |
| SCHEMBL6543930 | 0.78 | GAA (0.50) | TDP1ALDH1A1CYP3A4CA12CA1 | |
| SCHEMBL8119090 | 0.78 | PKM (0.53) | ALDH1A1MAPK1L3MBTL1HSD17B10MEN1 | |
| SCHEMBL6543473 | 0.78 | ALDH1A1 (0.50) | ALDH1A1CYP3A4MAPK1CA12CA1 | |
| SCHEMBL27733606 | 0.76 | ALDH1A1 (0.73) | TDP1ALDH1A1CYP3A4MAPK1CA12 | |
| SCHEMBL1759743 | 0.76 | TSHR (0.73) | TDP1ALDH1A1CYP3A4MAPK1CA12 | |
| P-Chlorobenzenesulfonamide SCHEMBL7527510 | 0.76 | CA12 (0.82) | TDP1ALDH1A1CYP3A4MAPK1CA12 | |
| SCHEMBL6544697 | 0.75 | ALDH1A1 (0.58) | ALDH1A1MAPK1CA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040248042-A1 | using material having both of dry etching resistance and high transparency in exposure light having a short wavelength such as F2 laser beam | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040234899-A1 | Method of forming fine pattern | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-11-25 | — | — | US | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| US-20040101787-A1 | Fine pattern forming method | DAIKIN INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1413927-A1 | METHOD FOR FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-1376230-A1 | FINE PATTERN FORMING METHOD | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6054254-A | COATING WITH PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-25 | — | — | US | disclosed |