Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | GMNN | O75496 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4608572 | 0.73 | KDM4E (0.38) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL6557498 | 0.70 | ALDH1A1 (0.41) | KDM4ELMNASMN1; SMN2ALDH1A1GAA | |
| SCHEMBL3874892 | 0.70 | KDM4E (0.35) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL1088788 | 0.70 | NPC1 (0.36) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL11046178 | 0.69 | KDM4E (0.30) | KDM4ELMNA | |
| SCHEMBL8057665 | 0.69 | EPHX2 (0.43) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL10697652 | 0.68 | KDM4E (0.39) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL10347490 | 0.68 | KDM4E (0.39) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL13005226 | 0.67 | KDM4E (0.30) | KDM4ELMNA | |
| SCHEMBL1077444 | 0.67 | TP53 (0.50) | KDM4ELMNAEPHX1TP53GMNN |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0921439-B1 | Photosensitive polymer and chemically amplified resist composition using the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2004-03-03 | — | — | EP | disclosed |
| US-6300036-B1 | COPOLYMER OF MALEIC ANHYDRIDE AND 2-NORBORNENE-5-METHANOL DERIVATIVE; ACCURATE PATTERNS WHEN EXPOSED TO ARGON FLUORIDE LASERS; DRY ETCHING RESISTANCE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-10-09 | — | — | US | disclosed |
| US-6103450-A | Photosensitive polymer, dissolution inhibitor and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-08-15 | — | — | US | disclosed |
| EP-0921439-A1 | Photosensitive polymer and chemically amplified resist composition using the same | Samsung Electronics Co., Ltd. (KR) | 1999-06-09 | — | — | EP | disclosed |