Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DHFR | P00374 | 1/20 | 0.32 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.31 |
| ▸ | ACACB | O00763 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6566091 | 0.97 | DHFR (0.35) | DHFRACACBKDM4CHSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566074 | 0.92 | LMNA (0.32) | DHFRLMNAKDM4CHSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564328 | 0.89 | DHFR (0.35) | DHFRLMNAKDM4CHSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564088 | 0.82 | PDE4B (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6564719 | 0.81 | MTNR1A (0.39) | LMNA | |
| Trifluoromethanesulfonic Acid SCHEMBL6564015 | 0.79 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6566405 | 0.79 | ACHE (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6564004 | 0.79 | GAA (0.39) | LMNA | |
| Trifluoromethanesulfonic Acid SCHEMBL648142 | 0.78 | PDE4B (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6564834 | 0.77 | MTNR1A (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |