Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566405

COCOc1ccc2c([S+]3CCCC3)cccc2c1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.33

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ACHE P22303 9/20 0.33
MTNR1A P48039 1/20 0.33
MTNR1B P49286 1/20 0.33
KCNH2 Q12809 2/20 0.32
MMP2 P08253 1/20 0.32
MMP3 P08254 1/20 0.32
MMP9 P14780 1/20 0.32
MMP14 P50281 1/20 0.32
GAA P10253 1/20 0.32
MAPK1 P28482 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
CYP2D6 P10635 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6565959 0.92 GAA (0.34) KCNH2GAAMAPK1TDP1L3MBTL1
Trifluoromethanesulfonic Acid SCHEMBL6566112 0.92 ACHE (0.35) ACHEMTNR1AMTNR1BMAPK1TDP1
Trifluoromethanesulfonic Acid SCHEMBL6562415 0.91 MTNR1A (0.35) ACHEMTNR1AMTNR1BKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564004 0.91 GAA (0.39) MTNR1AKCNH2GAAMAPK1TDP1
Trifluoromethanesulfonic Acid SCHEMBL6564719 0.90 MTNR1A (0.39) ACHEMTNR1AMTNR1BKCNH2TDP1
Trifluoromethanesulfonic Acid SCHEMBL6562385 0.89 MTNR1A (0.36) ACHEMTNR1AKCNH2MAPK1
Trifluoromethanesulfonic Acid SCHEMBL7794857 0.86 ALOX5 (0.43) GAATDP1
Trifluoromethanesulfonic Acid SCHEMBL6564834 0.85 MTNR1A (0.32) ACHEMTNR1AMTNR1BKCNH2CYP2D6
Trifluoromethanesulfonic Acid SCHEMBL6564802 0.84 MTNR1A (0.36) MTNR1AMTNR1BKCNH2MMP2MMP9
Trifluoromethanesulfonic Acid SCHEMBL6566222 0.83 MTNR1A (0.35) MTNR1AMTNR1BKCNH2GAAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed