SCHEMBL6562887

SCHEMBL6562887

[SiH3]OC(C#Cc1ccccc1)(C#Cc1ccccc1)CC#Cc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.43
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
THPO P40225 1/20 0.42
BLM P54132 1/20 0.41
PMP22 Q01453 1/20 0.41
HTR2A P28223 1/20 0.37
NPSR1 Q6W5P4 1/20 0.36
MAPT P10636 3/20 0.36
FFAR1 O14842 2/20 0.35
LMNA P02545 1/20 0.35
HTT P42858 1/20 0.35
PYCR1 P32322 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
GRM5 P41594 1/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562626 0.80 MAPT (0.40) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL6563098 0.72 APP (0.48) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL6564064 0.69 APP (0.44) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL32234906 0.69 CYP1A2 (0.52) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL6564084 0.68 APP (0.42) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL6562881 0.68 APP (0.42) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL6562532 0.67 MAPT (0.41) APPCYP1A2CYP3A4CYP2C9CYP2C19
Diphenylacetylene SCHEMBL27299894 0.66 APP (0.57) APPCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL6561445 0.66 MAPT (0.44) APPCYP1A2CYP3A4CYP2C9CYP2C19
Diphenylacetylene SCHEMBL960609 0.66 APP (1.00) APPCYP1A2CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed