SCHEMBL6562979

SCHEMBL6562979

CCCCn1c(-c2ccccc2)c(-c2ccccc2)c2ccccc21

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.62
KDM4E B2RXH2 6/20 0.56
MAPT P10636 1/20 0.56
PGR P06401 1/20 0.53
RORA P35398 1/20 0.53
RORC P51449 1/20 0.53
RORB Q92753 1/20 0.53
GAA P10253 1/20 0.50
TSHR P16473 2/20 0.49
ALPL P05186 1/20 0.47
ALPG P10696 1/20 0.47
RCE1 Q9Y256 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.46
TDP1 Q9NUW8 1/20 0.46
HPGD P15428 4/20 0.46
POLB P06746 1/20 0.46
PDE5A O76074 1/20 0.45
HTR3A P46098 1/20 0.45
MEN1 O00255 1/20 0.45
MAPK1 P28482 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28763406 0.81 KDM4E (0.63) ALDH1A1KDM4EMAPTGAA
SCHEMBL2292258 0.80 HTR3A (0.53) ALDH1A1KDM4EGAARCE1HPGD
SCHEMBL28547557 0.80 ALDH1A1 (0.53) ALDH1A1KDM4EMAPTPGRRORA
SCHEMBL9353406 0.80 ALDH1A1 (0.55) ALDH1A1KDM4EMAPTPGRRORA
SCHEMBL2853959 0.80 ALDH1A1 (0.62) ALDH1A1KDM4EMAPTPGRRORA
SCHEMBL29351201 0.79 FABP4 (0.67) ALDH1A1KDM4EMAPT
SCHEMBL1335135 0.77 PGR (0.73) ALDH1A1KDM4EPGRRORARORC
SCHEMBL29531665 0.77 PGR (0.73) ALDH1A1KDM4EPGRRORARORC
SCHEMBL7041227 0.76 KDM4E (0.58) ALDH1A1KDM4EMAPTPGRGAA
SCHEMBL13761875 0.76 ALDH1A1 (0.55) ALDH1A1KDM4EMAPTPGRRORA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6806019-B2 COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS CLARIANT FINANCE (BVI) LIMITED (VG) 2004-10-19 US disclosed
CN-1170204-C Radiation-sensitive resin composition �������ؽ��ڣ�BVI�����޹�˾ 2004-10-06 CN disclosed
CN-1169021-C Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition 克拉瑞特金融(BVI)有限公司 2004-09-29 CN disclosed
US-20040170917-A1 Method of forming thick resist pattern AZ ELECTRONIC MATERIALS USA CORP. 2004-09-02 US disclosed
EP-1400850-A1 METHOD OF FORMING THICK RESIST PATTERN CLARIANT INTERNATIONAL LTD. (CH) 2004-03-24 EP disclosed
EP-1345081-A1 HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN Clariant International Ltd. (CH) 2003-09-17 EP disclosed
US-6537719-B1 Both a resin and a photosensitive material, wherein a fluorescent material is incorporated CLARIANT FINANCE (BVI) LIMITED (VG) 2003-03-25 US disclosed
US-20030022093-A1 High-resolution photosensitive resin composition usable with i-line and method of forming pattern AZ ELECTRONIC MATERIALS USA CORP. 2003-01-30 US disclosed
CN-1313962-A Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition CLARIANT INT LTD (CH) 2001-09-19 CN disclosed
EP-1126319-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION CLARIANT INTERNATIONAL LTD. (CH) 2001-08-22 EP disclosed
CN-1294703-A Photosensitive resin compsn. CLARIANT INT LTD (CH) 2001-05-09 CN disclosed
EP-1087260-A1 PHOTOSENSITIVE RESIN COMPOSITION CLARIANT INTERNATIONAL LTD. (CH) 2001-03-28 EP disclosed