Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6564531

CCOC(=O)OC1CC[S+](c2ccccc2)C1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.33
MEN1 O00255 3/20 0.33
CYP2C19 P33261 3/20 0.33
TSHR P16473 2/20 0.33
HTT P42858 2/20 0.33
NPSR1 Q6W5P4 2/20 0.32
PKM P14618 1/20 0.32
ALDH1A1 P00352 4/20 0.32
MAPT P10636 4/20 0.32
HSD17B10 Q99714 2/20 0.32
TP53 P04637 1/20 0.32
HSD11B1 P28845 1/20 0.32
HPGD P15428 1/20 0.32
CYP2C9 P11712 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
KDM4E B2RXH2 1/20 0.31
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6562640 0.92 MLNR (0.33) CYP2C19ALDH1A1MAPTSMN1; SMN2
Trifluoromethanesulfonic Acid SCHEMBL6564000 0.90 POLB (0.34) CYP2C19TSHRALDH1A1HSD17B10HPGD
Trifluoromethanesulfonic Acid SCHEMBL6564518 0.88 RORC (0.33) KMT2ACYP2C19TSHRMAPT
Trifluoromethanesulfonic Acid SCHEMBL6562721 0.86 STS (0.30)
Trifluoromethanesulfonic Acid SCHEMBL6562885 0.85 CYP2C19 (0.31) CYP2C19
Trifluoromethanesulfonic Acid SCHEMBL6564774 0.84 HSD11B1 (0.34) HSD11B1
Trifluoromethanesulfonic Acid SCHEMBL2745117 0.84 ALDH1A1 (0.38) KMT2ATSHRNPSR1PKMALDH1A1
Trifluoromethanesulfonic Acid SCHEMBL6564008 0.81 KCNH2 (0.33)
Trifluoromethanesulfonic Acid SCHEMBL6564807 0.81
Trifluoromethanesulfonic Acid SCHEMBL6562807 0.81 GPR3 (0.34) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed