Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566341

CC(C)[S+](c1cccc2ccccc12)C(C)C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 2/20 0.37
NLRP3 Q96P20 1/20 0.34
KEAP1 Q14145 1/20 0.34
KCNJ11 Q14654 2/20 0.34
KCNH2 Q12809 6/20 0.33
ACHE P22303 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
KDM4E B2RXH2 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
HTR6 P50406 1/20 0.32
HSD17B2 P37059 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL31168285 0.83 GPR3 (0.40) GPR3NLRP3KEAP1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL645454 0.83 GPR3 (0.40) GPR3NLRP3KEAP1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL31235599 0.83 GPR3 (0.42) GPR3NLRP3KEAP1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL66197 0.83 GPR3 (0.42) GPR3NLRP3KEAP1KCNH2ACHE
Trifluoromethanesulfonic Acid SCHEMBL646691 0.79 KCNH2 (0.39) GPR3KEAP1KCNH2ACHECA1
Trifluoromethanesulfonic Acid SCHEMBL31168264 0.79 KCNH2 (0.39) GPR3KEAP1KCNH2ACHECA1
Trifluoromethanesulfonic Acid SCHEMBL36034 0.78 GPR3 (0.38) GPR3KEAP1KCNH2ACHECA1
Trifluoromethanesulfonic Acid SCHEMBL31564951 0.78 GPR3 (0.38) GPR3KEAP1KCNH2ACHECA1
Trifluoromethanesulfonic Acid SCHEMBL547976 0.78 GPR3 (0.38) GPR3KEAP1KCNH2ACHECA1
Trifluoromethanesulfonic Acid SCHEMBL29402880 0.78 GPR3 (0.38) GPR3KEAP1KCNH2ACHECA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed