Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | CHRM5 | P08912 | 3/20 | 0.48 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.48 |
| ▸ | CHRM3 | P20309 | 3/20 | 0.48 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.48 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.48 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.48 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | PGR | P06401 | 1/20 | 0.48 |
| ▸ | HTR1A | P08908 | 1/20 | 0.48 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.48 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.48 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.48 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.48 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.48 |
| ▸ | GALR3 | O60755 | 2/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17401258 | 0.97 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL7796998 | 0.93 | ALDH1A1 (0.50) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL1909276 | 0.91 | ALDH1A1 (0.43) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL15221517 | 0.91 | ALDH1A1 (0.43) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL17401256 | 0.90 | ALDH1A1 (0.46) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL10357699 | 0.89 | ALDH1A1 (0.41) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL454947 | 0.87 | ALDH1A1 (0.50) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL65170 | 0.87 | ALDH1A1 (0.50) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL24177786 | 0.87 | ALDH1A1 (0.61) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 | |
| SCHEMBL11722098 | 0.87 | ALDH1A1 (0.61) | ALDH1A1CHRM5CHRM1CHRM3CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231227-A1 | OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2024-07-11 | — | — | US | claimed |
| CN-117440944-A | Oxothiazonium ion-containing sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化学品有限公司 | 2024-01-23 | — | — | CN | claimed |
| WO-2022272226-A1 | OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC (US) | 2022-12-29 | — | — | WO | claimed |
| US-9709886-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2017-07-18 | — | — | US | claimed |
| US-20170003587-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2017-01-05 | — | — | US | claimed |
| WO-2026101739-A1 | CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC (US) | 2026-05-15 | — | — | WO | disclosed |
| CN-122037094-A | Block copolymer having cleavable main chain, photoresist composition comprising the same, and pattern forming method | 杜邦电子材料国际有限责任公司 | 2026-05-15 | — | — | CN | disclosed |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-14 | — | — | US | disclosed |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-04-02 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20260079399-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-03-19 | — | — | US | disclosed |
| US-20260079398-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-03-19 | — | — | US | disclosed |
| US-5888959-A | HEATING, NEUTRALIZATION OF ACID CATALYST | BASF AKTIENGESELLSCHAFT (DE) | 1999-03-30 | — | — | US | disclosed |
| EP-0775168-B1 | METHOD FOR PRODUCING CONDENSATION POLYMERS OF ASPARTIC ACID AND USE OF THE CONDENSATION POLYMERS | BASF AG (DE) | 1998-04-01 | — | — | EP | disclosed |
| EP-0775168-A1 | METHOD FOR PRODUCING CONDENSATION POLYMERS OF ASPARTIC ACID AND USE OF THE CONDENSATION POLYMERS | BASF AKTIENGESELLSCHAFT (DE) | 1997-05-28 | — | — | EP | disclosed |
| WO-1996005242-A1 | METHOD FOR PRODUCING CONDENSATION POLYMERS OF ASPARTIC ACID AND USE OF THE CONDENSATION POLYMERS | BASF AKTIENGESELLSCHAFT (DE) | 1996-02-22 | — | — | WO | disclosed |
| EP-0187298-B1 | ORGANIC QUATERNARY AMMONIUM COMPOUNDS AND PROCESS FOR THEIR PREPARATION | INTEROX Société Anonyme (BE) | 1990-05-23 | — | — | EP | disclosed |
| US-4863483-A | CROSSLINKING AGENT, CURING FIBERS | BASF AUSTRALIA LTD. (AU) | 1989-09-05 | — | — | US | disclosed |
| US-4675131-A | Organic quaternary ammonium compounds and process for the preparation thereof | INTEROX(SOCIETE ANONYME) (BE) | 1987-06-23 | — | — | US | disclosed |
| EP-0187298-A2 | Organic quaternary ammonium compounds and process for their preparation | INTEROX Société Anonyme (BE) | 1986-07-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260079398-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | ARCN1, SMC4, CCT4 | ALDH1A1 1499/4885CHRM5 1786/4885CHRM1 480/4885 |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DCLRE1A, CD79B, RAD1 | ALDH1A1 2959/4885CHRM5 3641/4885CHRM1 2760/4885 |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | ETV6, KCNQ4, KCNQ1 | ALDH1A1 3046/4885CHRM5 4601/4885CHRM1 3698/4885 |
| US-20170003587-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | ALAD, MPST, ASIC1 | ALDH1A1 1257/4885CHRM5 4645/4885CHRM1 4254/4885 |
| US-20260079399-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS | GAR1, RPA1, ARL1 | ALDH1A1 237/4885CHRM5 2640/4885CHRM1 381/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | ALDH1A1 3281/4885CHRM5 2739/4885CHRM1 953/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.