SCHEMBL658619

SCHEMBL658619

CC1CCCCC1Cc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 7/20 0.38
PTGS2 P35354 6/20 0.38
MT-CO1 P00395 1/20 0.38
MT-CO2 P00403 1/20 0.38
LMNA P02545 3/20 0.36
ALDH1A1 P00352 5/20 0.36
HTT P42858 2/20 0.36
USP2 O75604 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
KMT2A Q03164 3/20 0.35
GLA P06280 1/20 0.35
POLB P06746 1/20 0.35
GAA P10253 1/20 0.35
MAPT P10636 1/20 0.35
STAT3 P40763 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
TSHR P16473 1/20 0.35
NT5E P21589 1/20 0.35
MEN1 O00255 2/20 0.35
TDP1 Q9NUW8 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7100552 0.83 PTGS1 (0.51) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL780173 0.81 LMNA (0.36) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL9101011 0.79 MEN1 (0.36) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL8763564 0.78 MEN1 (0.46) LMNAALDH1A1HTTKMT2AGAA
SCHEMBL656154 0.77 KMT2A (0.44) LMNAALDH1A1HTTKMT2AGAA
SCHEMBL16191312 0.76 CES2 (0.43) PTGS1PTGS2MT-CO1MT-CO2KMT2A
SCHEMBL16191082 0.74 POLB (0.46) ALDH1A1USP2POLB
SCHEMBL9950053 0.74 PTGS1 (0.39) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL2944821 0.74 MEN1 (0.43) LMNAHTTKMT2AGAATSHR
SCHEMBL5070934 0.71 ALDH1A1 (0.43) LMNAALDH1A1HTTKMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9982157-B2 Aqueous laser-sensitive composition for marking substrates DATALASE LTD. (GB) 2018-05-29 US disclosed
EP-2349734-B1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DATALASE LTD (GB) 2018-03-28 EP disclosed
US-9333786-B2 Laser-sensitive coating formulations DATALASE, LTD. (GB) 2016-05-10 US disclosed
US-9267042-B2 Coating composition for marking substrates DATALASE LTD. (GB) 2016-02-23 US disclosed
US-20150361289-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DATALASE LTD. (GB) 2015-12-17 US disclosed
US-20120045624-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2012-02-23 US disclosed
US-20110274893-A1 COATING COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2011-11-10 US disclosed
US-8021820-B2 Coating composition for marking substrates DATALASE LTD. (GB) 2011-09-20 US disclosed
EP-2349734-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES DataLase Ltd (GB) 2011-08-03 EP disclosed
EP-2342295-A1 COATING COMPOSITION FOR MARKING SUBSTRATES DataLase Ltd (GB) 2011-07-13 EP disclosed
US-20100233447-A1 LASER-SENSITIVE COATING FORMULATIONS CIBA CORPORATION (US) 2010-09-16 US disclosed
WO-2010049281-A1 AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2010-05-06 WO disclosed
WO-2010049282-A1 COATING COMPOSITION FOR MARKING SUBSTRATES BASF SE (DE) 2010-05-06 WO disclosed
EP-2167323-A1 LASER-SENSITIVE COATING FORMULATION BASF SE (DE) 2010-03-31 EP disclosed
US-20090191420-A1 Coating Composition for Marking Substrates CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2009-07-30 US disclosed
WO-2009010405-A1 LASER-SENSITIVE COATING FORMULATION BASF SE (CH) 2009-01-22 WO disclosed
EP-1981717-A1 COATING COMPOSITION FOR MARKING SUBSTRATES Ciba Holding Inc. (CH) 2008-10-22 EP disclosed
WO-2007088104-A1 COATING COMPOSITION FOR MARKING SUBSTRATES CIBA HOLDING INC. (CH) 2007-08-09 WO disclosed
US-5489501-A MIXTURES OF TWO COORDINATION COMPOUNDS WHICH REACT TO FORM NEW COORDINATION COMPOUND WHILE CAUSING VISIBLE COLOR CHANGES RICOH COMPANY, LTD. (JP) 1996-02-06 US disclosed
US-5446011-A Imagewise coloring when heating; mixture of n-substituted indole, aromatic polyhydroxy compound, carbonyl compound and an acid RICOH COMPANY, LTD. (JP) 1995-08-29 US disclosed