SCHEMBL7100552

SCHEMBL7100552

O=S(=O)(O)c1ccc(CC2CCCCC2O)cc1

nearest known ligand 0.51

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 12/20 0.51
PTGS2 P35354 12/20 0.51
MT-CO1 P00395 1/20 0.51
MT-CO2 P00403 1/20 0.51
CA1 P00915 3/20 0.39
CA2 P00918 3/20 0.39
CA4 P22748 3/20 0.39
CA6 P23280 2/20 0.39
LMNA P02545 1/20 0.37
SLC18A3 Q16572 2/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL780173 0.83 LMNA (0.36) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL658619 0.83 PTGS1 (0.38) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL9101011 0.80 MEN1 (0.36) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL8763564 0.80 MEN1 (0.46) CA1CA2LMNASLC18A3CA7
SCHEMBL656154 0.78 KMT2A (0.44) CA1CA2LMNASLC18A3CA7
SCHEMBL8924212 0.76 PTGS1 (0.50) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL8924209 0.76 PTGS1 (0.50) PTGS1PTGS2MT-CO1MT-CO2LMNA
SCHEMBL5131364 0.76 PTGS1 (0.53) PTGS1PTGS2MT-CO1MT-CO2CA1
SCHEMBL8414650 0.75 PTGS1 (0.55) PTGS1PTGS2MT-CO1MT-CO2SLC18A3
SCHEMBL8414651 0.75 PTGS1 (0.55) PTGS1PTGS2MT-CO1MT-CO2SLC18A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0155435-B1 PROCESS FOR PREPARING CROSS-LINKED POLYMERS BY CATIONIC POLYMERISATION OF UNSATURATED BICYCLIC IMIDES CIBA-GEIGY AG (CH) 1989-08-23 EP claimed
EP-0155435-A2 Process for preparing cross-linked polymers by cationic polymerisation of unsaturated bicyclic imides CIBA-GEIGY AG (CH) 1985-09-25 EP claimed
CN-1237399-C Organis antireflective coating composition and method for forming photoresist pattern with the same composition HAERYOKSA SEMICONDUCTOR CO LTD (KR) 2006-01-18 CN disclosed
CN-1469196-A Organis antireflective coating composition and method for forming photoresist pattern with the same composition ����ʿ�뵼�����޹�˾ 2004-01-21 CN disclosed
WO-2003098670-A1 LIGHT-ABSORBING POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE LAYER, COMPOSITION INCLUDING THE SAME, AND METHOD FOR FORMING SEMICONDUCTOR DEVICE PATTERN USING THE SAME MOLAY CO., LTD. (KR) 2003-11-27 WO disclosed
EP-0155435-B1 PROCESS FOR PREPARING CROSS-LINKED POLYMERS BY CATIONIC POLYMERISATION OF UNSATURATED BICYCLIC IMIDES CIBA-GEIGY AG (CH) 1989-08-23 EP disclosed
EP-0155435-A2 Process for preparing cross-linked polymers by cationic polymerisation of unsaturated bicyclic imides CIBA-GEIGY AG (CH) 1985-09-25 EP disclosed